|
English
|
正體中文
|
简体中文
|
0
|
|
???header.visitor??? :
52647264
???header.onlineuser??? :
855
???header.sponsordeclaration???
|
|
|
|
???tair.name??? >
???browser.page.title.author???
|
"lai wk"???jsp.browse.items-by-author.description???
Showing items 1-10 of 10 (1 Page(s) Totally) 1 View [10|25|50] records per page
| 中山醫學大學 |
2021 |
Developing Lactic Acid Bacteria as an Oral Healthy Food
|
Lai, WK; Lu, YC; Hsieh, CR; Wei, CK; Tsai, YH; Chang, FR; Chan, Y |
| 國立交通大學 |
2019-04-02T05:59:08Z |
The oxidation mechanism of low-pressure dry oxidation of nitrides for memory devices
|
Liu, HW; Su, HP; Lai, WK; Cheng, HC |
| 國立交通大學 |
2019-04-02T05:58:47Z |
Effects of RCA clean-up procedures on the formation of roughened poly-Si electrodes for high-density DRAMs' capacitors
|
Liu, HW; Lai, WK; Yu, SY; Huang, SC; Cheng, HC |
| 國立交通大學 |
2014-12-08T15:48:55Z |
A novel process to form cobalt silicided p(+) poly-Si gates by BF2+ implantation into bilayered CoSi/a-Si films and subsequent anneal
|
Lai, WK; Liu, HW; Juang, MH; Chen, NC; Cheng, HC |
| 國立交通大學 |
2014-12-08T15:47:36Z |
Effects of CoSi2 on p(+) polysilicon gates fabricated by BF2+ implantation into CoSi amorphous Si bilayers
|
Cheng, HC; Lai, WK; Liu, HW; Juang, MH |
| 國立交通大學 |
2014-12-08T15:46:27Z |
Effects of rapid thermal annealing on cobalt silicided p(+) poly-Si gates fabricated by BF2+ implantation into bilayered CoSi/a-Si films
|
Lai, WK; Liu, HW; Juang, MH; Cheng, HC |
| 國立交通大學 |
2014-12-08T15:46:12Z |
Suppression of boron penetration for p(+) stacked poly-Si gates by using inductively coupled N-2 plasma treatment
|
Cheng, HC; Lai, WK; Hwang, CC; Juang, MH; Chu, SC; Liu, TF |
| 國立交通大學 |
2014-12-08T15:02:52Z |
Investigation of the dosage effect on the activation of arsenic- and boron-implanted low-pressure chemical vapor deposition (LPCVD) amorphous-silicon films
|
Wang, FS; Tsai, MJ; Lai, WK; Cheng, HC |
| 國立交通大學 |
2014-12-08T15:01:31Z |
The oxidation mechanism of low-pressure dry oxidation of nitrides for memory devices
|
Liu, HW; Su, HP; Lai, WK; Cheng, HC |
| 國立交通大學 |
2014-12-08T15:01:19Z |
Effects of RCA clean-up procedures on the formation of roughened poly-Si electrodes for high-density DRAMs' capacitors
|
Liu, HW; Lai, WK; Yu, SY; Huang, SC; Cheng, HC |
Showing items 1-10 of 10 (1 Page(s) Totally) 1 View [10|25|50] records per page
|