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臺灣學術機構典藏系統 (Taiwan Academic Institutional Repository, TAIR)
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Institution Date Title Author
中山醫學大學 2021 Developing Lactic Acid Bacteria as an Oral Healthy Food Lai, WK; Lu, YC; Hsieh, CR; Wei, CK; Tsai, YH; Chang, FR; Chan, Y
國立交通大學 2019-04-02T05:59:08Z The oxidation mechanism of low-pressure dry oxidation of nitrides for memory devices Liu, HW; Su, HP; Lai, WK; Cheng, HC
國立交通大學 2019-04-02T05:58:47Z Effects of RCA clean-up procedures on the formation of roughened poly-Si electrodes for high-density DRAMs' capacitors Liu, HW; Lai, WK; Yu, SY; Huang, SC; Cheng, HC
國立交通大學 2014-12-08T15:48:55Z A novel process to form cobalt silicided p(+) poly-Si gates by BF2+ implantation into bilayered CoSi/a-Si films and subsequent anneal Lai, WK; Liu, HW; Juang, MH; Chen, NC; Cheng, HC
國立交通大學 2014-12-08T15:47:36Z Effects of CoSi2 on p(+) polysilicon gates fabricated by BF2+ implantation into CoSi amorphous Si bilayers Cheng, HC; Lai, WK; Liu, HW; Juang, MH
國立交通大學 2014-12-08T15:46:27Z Effects of rapid thermal annealing on cobalt silicided p(+) poly-Si gates fabricated by BF2+ implantation into bilayered CoSi/a-Si films Lai, WK; Liu, HW; Juang, MH; Cheng, HC
國立交通大學 2014-12-08T15:46:12Z Suppression of boron penetration for p(+) stacked poly-Si gates by using inductively coupled N-2 plasma treatment Cheng, HC; Lai, WK; Hwang, CC; Juang, MH; Chu, SC; Liu, TF
國立交通大學 2014-12-08T15:02:52Z Investigation of the dosage effect on the activation of arsenic- and boron-implanted low-pressure chemical vapor deposition (LPCVD) amorphous-silicon films Wang, FS; Tsai, MJ; Lai, WK; Cheng, HC
國立交通大學 2014-12-08T15:01:31Z The oxidation mechanism of low-pressure dry oxidation of nitrides for memory devices Liu, HW; Su, HP; Lai, WK; Cheng, HC
國立交通大學 2014-12-08T15:01:19Z Effects of RCA clean-up procedures on the formation of roughened poly-Si electrodes for high-density DRAMs' capacitors Liu, HW; Lai, WK; Yu, SY; Huang, SC; Cheng, HC

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