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| 國立成功大學 |
2006 |
Investigation of the Hf-based gate dielectrics deposited by reactive sputtering in oxygen or nitrogen atmosphere
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Lu, Cheng-Hsueh; Lai, Yi-Sheng; Chen, J. S. |
| 國立成功大學 |
2005-11 |
Compositional tailored sol-gel SiO2-TiO2 thin films: Crystallization, chemical bonding configuration, and optical properties
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Yang, Li-Lan; Lai, Yi-Sheng; Chen, Jen-Sue; Tsai, P. H.; Chen, C. L.; Chang, C. Jason |
| 國立成功大學 |
2005-09-22 |
Effect of heat treatment on the properties of non-stoichiometric p-type nickel oxide films deposited by reactive sputtering
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Yang, Jiin-Long; Lai, Yi-Sheng; Chen, Jen-Sue |
| 國立成功大學 |
2005-09-19 |
Bistable resistance switching of poly(N-vinylcarbazole) films for nonvolatile memory applications
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Lai, Yi-Sheng; Tu, Chia-Hsun; Kwong, Dim-Lee; Chen, Jen-Sue |
| 國立成功大學 |
2005 |
Comparison of thermal stability and chemical bonding configurations of plasma oxynitrided Hf and Zr thin films
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Lai, Yi-Sheng; Lu, C. H.; Chen, Li-Min; Chen, Jen-Sue |
| 國立成功大學 |
2005 |
Energy dependence of radiation damage in Sb-implanted Si(100)
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Lai, Yi-Sheng; Chen, Jen-Sue; Ho, Y. S.; Sun, H. L.; Tsai, C. J.; Chen, T. C.; Ko, Y. F.; Lee, F. S.; You, W. M. |
| 國立成功大學 |
2004 |
Interlayer growth and electrical behavior of Ta2O5/SiOxNy/Si gate stacks
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Lai, Yi-Sheng; Chen, Jen-Sue; Wang, J. L. |
| 國立成功大學 |
2003-05-30 |
超薄氮氧化矽作為五氧化二鉭閘極氧化層之中介層特性研究
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賴宜生; Lai, Yi-Sheng |
| 國立成功大學 |
2003-05-30 |
超薄氮氧化矽作為五氧化二鉭閘極氧化層之中介層特性研究
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賴宜生; Lai, Yi-Sheng |
| 國立成功大學 |
2003-05 |
Evolution of chemical bonding configuration in ultrathin SiOxNy layers grown by low-temperature plasma nitridation
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Lai, Yi-Sheng; Chen, Jen-Sue |
| 國立成功大學 |
2002-12-02 |
Spectroscopic ellipsometry study on the structure of Ta2O5/SiOxNy/Si gate dielectric stacks
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Lai, Yi-Sheng; Chen, Jen-Sue |
| 國立成功大學 |
2002-07 |
Effects of plasma prenitridation and postdeposition annealing on the structural and dielectric characteristics of the Ta2O5/Si system
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Lai, Yi-Sheng; Chen, Kuan-Jen; Chen, Jen-Sue |
| 國立成功大學 |
2002-05-15 |
Investigation of the interlayer characteristics of Ta2O5 thin films deposited on bare, N2O, and NH3 plasma nitridated Si substrates
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Lai, Yi-Sheng; Chen, Kuan-Jen; Chen, Jen-Sue |
| 國立成功大學 |
2001-07 |
Characterization of tantalum pentoxide dielectric films grown by low-pressure and plasma-enhanced chemical vapor deposition
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Lai, Yi-Sheng; Chen, Jen-Sue |
| 國立成功大學 |
2001-07 |
Comparison of dielectric characteristics of Ta2O5 thin films on RuO2 and Ru bottom electrodes
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Huang, J. H.; Lai, Yi-Sheng; Chen, Jen-Sue |
Showing items 36-50 of 50 (2 Page(s) Totally)
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