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"lai yi sheng"
Showing items 41-50 of 50 (1 Page(s) Totally)
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| 國立成功大學 |
2005 |
Energy dependence of radiation damage in Sb-implanted Si(100)
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Lai, Yi-Sheng; Chen, Jen-Sue; Ho, Y. S.; Sun, H. L.; Tsai, C. J.; Chen, T. C.; Ko, Y. F.; Lee, F. S.; You, W. M. |
| 國立成功大學 |
2004 |
Interlayer growth and electrical behavior of Ta2O5/SiOxNy/Si gate stacks
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Lai, Yi-Sheng; Chen, Jen-Sue; Wang, J. L. |
| 國立成功大學 |
2003-05-30 |
超薄氮氧化矽作為五氧化二鉭閘極氧化層之中介層特性研究
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賴宜生; Lai, Yi-Sheng |
| 國立成功大學 |
2003-05-30 |
超薄氮氧化矽作為五氧化二鉭閘極氧化層之中介層特性研究
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賴宜生; Lai, Yi-Sheng |
| 國立成功大學 |
2003-05 |
Evolution of chemical bonding configuration in ultrathin SiOxNy layers grown by low-temperature plasma nitridation
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Lai, Yi-Sheng; Chen, Jen-Sue |
| 國立成功大學 |
2002-12-02 |
Spectroscopic ellipsometry study on the structure of Ta2O5/SiOxNy/Si gate dielectric stacks
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Lai, Yi-Sheng; Chen, Jen-Sue |
| 國立成功大學 |
2002-07 |
Effects of plasma prenitridation and postdeposition annealing on the structural and dielectric characteristics of the Ta2O5/Si system
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Lai, Yi-Sheng; Chen, Kuan-Jen; Chen, Jen-Sue |
| 國立成功大學 |
2002-05-15 |
Investigation of the interlayer characteristics of Ta2O5 thin films deposited on bare, N2O, and NH3 plasma nitridated Si substrates
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Lai, Yi-Sheng; Chen, Kuan-Jen; Chen, Jen-Sue |
| 國立成功大學 |
2001-07 |
Characterization of tantalum pentoxide dielectric films grown by low-pressure and plasma-enhanced chemical vapor deposition
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Lai, Yi-Sheng; Chen, Jen-Sue |
| 國立成功大學 |
2001-07 |
Comparison of dielectric characteristics of Ta2O5 thin films on RuO2 and Ru bottom electrodes
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Huang, J. H.; Lai, Yi-Sheng; Chen, Jen-Sue |
Showing items 41-50 of 50 (1 Page(s) Totally)
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