|
English
|
正體中文
|
简体中文
|
总笔数 :2856699
|
|
造访人次 :
53577828
在线人数 :
878
教育部委托研究计画 计画执行:国立台湾大学图书馆
|
|
|
"lei tf"的相关文件
顯示項目 126-135 / 214 (共22頁)
<< < 8 9 10 11 12 13 14 15 16 17 > >>
每頁顯示[10|25|50]項目
| 國立交通大學 |
2014-12-08T15:05:46Z |
REFRACTIVE-INDEX PROFILE MEASUREMENT OF COMPOUND THIN-FILMS BY ELLIPSOMETRY
|
HO, JH; LEE, CL; LEI, TF |
| 國立交通大學 |
2014-12-08T15:05:39Z |
NUMERICAL-SIMULATION OF THE VERTICAL KELVIN TEST STRUCTURE FOR SPECIFIC CONTACT RESISTIVITY
|
LEU, LY; LEE, CL; LEI, TF; YANG, WL |
| 國立交通大學 |
2014-12-08T15:05:38Z |
ELLIPSOMETRY MEASUREMENT OF THE COMPLEX REFRACTIVE-INDEX AND THICKNESS OF POLYSILICON THIN-FILMS
|
HO, JH; LEE, CL; LEI, TF; CHAO, TS |
| 國立交通大學 |
2014-12-08T15:05:37Z |
IMPROVEMENT ON THE CURRENT-VOLTAGE CHARACTERISTICS OF POLYCRYSTALLINE SILICON CONTACTED N+-P JUNCTIONS WITH HIGH-FIELD STRESSING
|
WU, SL; LEE, CL; LEI, TF |
| 國立交通大學 |
2014-12-08T15:05:32Z |
ELLIPSOMETRY MEASUREMENTS ON REFRACTIVE-INDEX PROFILES OF THIN-FILMS
|
HO, JH; LEE, CL; LEI, TF |
| 國立交通大學 |
2014-12-08T15:05:26Z |
IMPROVEMENT OF ELECTRICAL CHARACTERISTICS OF POLYCRYSTALLINE SILICON-CONTACTED DIODES AFTER FORWARD BIAS STRESSING
|
WU, SL; LEE, CL; LEI, TF |
| 國立交通大學 |
2014-12-08T15:05:25Z |
AN SCR WITH SIMPLE MIS STRUCTURE
|
CHANG, DCY; LEE, CL; LEI, TF |
| 國立交通大學 |
2014-12-08T15:05:14Z |
MEASUREMENT OF ULTRATHIN (LESS-THAN-100-A) OXIDE-FILMS BY MULTIPLE-ANGLE INCIDENT ELLIPSOMETRY
|
CHAO, TS; LEE, CL; LEI, TF |
| 國立交通大學 |
2014-12-08T15:05:11Z |
A REAL-TIME C-V MEASUREMENT CIRCUIT FOR MOS CAPACITORS UNDER CURRENT STRESSING
|
LEE, CL; LEI, TF; HO, JH; WANG, WT |
| 國立交通大學 |
2014-12-08T15:05:03Z |
HIGH-PERFORMANCE POLYSILICON CONTACTED SHALLOW JUNCTIONS FORMED BY STACKED-AMORPHOUS-SILICON FILMS
|
WU, SL; LEE, CL; LEI, TF |
顯示項目 126-135 / 214 (共22頁)
<< < 8 9 10 11 12 13 14 15 16 17 > >>
每頁顯示[10|25|50]項目
|
