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机构 日期 题名 作者
國立交通大學 2014-12-08T15:02:13Z Suppression of boron penetration in BF2+-implanted poly-Si gate Chao, TS; Chu, CH; Wang, CF; Ho, KJ; Lei, TF; Lee, CL
國立交通大學 2014-12-08T15:02:08Z Investigation of the polarity asymmetry on the electrical characteristics of thin polyoxides grown on N+ polysilicon Wu, SL; Chen, CY; Lin, TY; Lee, CL; Lei, TF; Liang, MS
國立交通大學 2014-12-08T15:02:07Z A novel planarization of oxide-filled shallow-trench isolation Cheng, JY; Lei, TF; Chao, TS; Yen, DLW; Lin, CJ
國立交通大學 2014-12-08T15:02:02Z Effects of bromine-methanol and hydrogen chloride pretreatments on Pt/Al/n-InP diodes Huang, WC; Lei, TF; Lee, CL
國立交通大學 2014-12-08T15:01:56Z A novel shallow trench isolation technique Cheng, JY; Lei, TF; Chao, TS
國立交通大學 2014-12-08T15:01:56Z Suppression of boron penetration in P+-poly-Si gate metal-oxide-semiconductor transistor using nitrogen implantation Chao, TS; Chien, CH; Hao, CP; Liaw, MC; Chu, CH; Chang, CY; Lei, TF; Sun, WT; Hsu, CH
國立交通大學 2014-12-08T15:01:54Z MOS magnetic current sensor based on standard CMOS process Yang, HM; Lei, TF; Huang, YC; Lee, CL
國立交通大學 2014-12-08T15:01:44Z Hydrogen and oxygen plasma effects on polycrystalline silicon thin films of various thicknesses Liou, BW; Lee, CL; Lei, TF; Wu, YH
國立交通大學 2014-12-08T15:01:42Z Suppression of boron penetration by using inductive-coupling-nitrogen-plasma in stacked amorphous/polysilicon gate structure Yang, WL; Lin, CJ; Chao, TS; Liu, DG; Lei, TF
國立交通大學 2014-12-08T15:01:39Z Plasma charging damage and water-related hot-carrier reliability in the deposition of plasma-enhanced tetraethylorthosilicate oxide Lin, YM; Jang, SM; Yu, CH; Lei, TF; Chen, JY
國立交通大學 2014-12-08T15:01:35Z The characteristics of polysilicon oxide grown on amorphous silicon deposited from disilane Lin, YM; Lei, TF
國立交通大學 2014-12-08T15:01:34Z Improvement of water-related hot-carrier reliability by optimizing the plasma-enhanced tetra-ethoxysilane deposition process Lin, YM; Jang, SM; Yu, CH; Lei, TF
國立交通大學 2014-12-08T15:01:30Z Monitoring trapped charge generation for gate oxide under stress Lin, YH; Lee, CL; Lei, TF
國立交通大學 2014-12-08T15:01:07Z Suppression of boron penetration in p(+) polysilicon gate using Si-B diffusion source Chao, TS; Kuo, CP; Lei, TF; Chen, TP; Huang, TY; Chang, CY

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