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"lei tf"的相关文件
显示项目 46-70 / 214 (共9页)
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| 國立交通大學 |
2014-12-08T15:43:18Z |
Comparison of novel cleaning solutions, with various chelating agents for post-CMP cleaning on poly-Si film
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Pan, TM; Lei, TF; Ko, FH; Chao, TS; Chiu, TH; Lee, YH; Lu, CP |
| 國立交通大學 |
2014-12-08T15:43:07Z |
Nitrogen implantation and in situ HF vapor clean for deep submicrometer n-MOSFETs
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Chen, JH; Lei, TF; Chen, CL; Chao, TS; Wen, WY; Chen, KT |
| 國立交通大學 |
2014-12-08T15:42:25Z |
Characteristics of polycrystalline silicon thin-film transistors with electrical source/drain extensions induced by a bottom sub-gate
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Yu, M; Lin, HC; Chen, GH; Huang, TY; Lei, TF |
| 國立交通大學 |
2014-12-08T15:42:23Z |
Performance evaluation of cleaning solutions enhanced with tetraalkylammonium hydroxide substituents for post-CMP cleaning on poly-Si film
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Pan, TM; Lei, TF; Ko, FH; Chao, TS; Liaw, MC; Lee, YH; Lu, CP |
| 國立交通大學 |
2014-12-08T15:42:22Z |
Thin oxides grown on disilane-based polysilicon
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Lee, JW; Lei, TF; Lee, CL |
| 國立交通大學 |
2014-12-08T15:42:14Z |
Improvement of low-temperature gate dielectric formed in N2O plasma by an additional CF4 pretreatment process
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Chang, TY; Lei, TF; Chao, TS; Wen, HC; Chen, HW |
| 國立交通大學 |
2014-12-08T15:42:08Z |
Numerical simulation of quantum effects in high-k gate dielectric MOS structures using quantum mechanical models
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Li, YM; Lee, JW; Tang, TW; Chao, TS; Lei, TF; Sze, SM |
| 國立交通大學 |
2014-12-08T15:42:06Z |
Observation of differential capacitance images on slightly iron-contaminated p-type silicon
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Chang, MN; Chen, CY; Pan, FM; Chang, TY; Lei, TF |
| 國立交通大學 |
2014-12-08T15:42:06Z |
Self-aligned fabrication of thin-film transistors with field-induced drain
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Yu, CM; Lin, HC; Lin, CY; Yeh, KL; Huang, TY; Lei, TF |
| 國立交通大學 |
2014-12-08T15:42:06Z |
Impact of nitrogen and/or fluorine implantation on deep-submicron Co-salicide process
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Chang, TY; Lei, TF; Chao, TS; Chen, SW; Kao, LM; Chen, SK; Tuan, A; Su, TP |
| 國立交通大學 |
2014-12-08T15:41:51Z |
A physical model for the hysteresis phenomenon of the ultrathin ZrO2 film
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Wang, JC; Chiao, SH; Lee, CL; Lei, TF; Lin, YM; Wang, MF; Chen, SC; Yu, CH; Liang, MS |
| 國立交通大學 |
2014-12-08T15:41:47Z |
Improving the electrical integrity of Cu-CoSi2 contacted n(+)p junction diodes using nitrogen-incorporated Ta films as a diffusion barrier
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Yang, WL; Wu, WF; You, HC; Ou, KL; Lei, TF; Chou, CP |
| 國立交通大學 |
2014-12-08T15:41:43Z |
Effect of CF4 plasma pretreatment on low temperature oxides
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Chang, TY; Chen, HW; Lei, TF; Chao, TS |
| 國立交通大學 |
2014-12-08T15:41:37Z |
Growing high-performance tunneling oxide by CF4 plasma pretreatment
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Chang, TY; Lee, JW; Lei, TF; Lee, CL; Wen, HC |
| 國立交通大學 |
2014-12-08T15:41:32Z |
Characteristics of vertical thermal/PECVD polysilicon oxides formed on the sidewall of polysilicon films
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Lee, MZ; Chang, YA; Lee, CL; Lei, TF |
| 國立交通大學 |
2014-12-08T15:41:27Z |
Effects of BCl3 passivation on Pt/Al/n-InP diodes
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Huang, WC; Lei, TF; Lee, CL |
| 國立交通大學 |
2014-12-08T15:41:08Z |
Novel vertical polysilicon thin-film transistor with excimer-laser annealing
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Lee, MZ; Lee, CL; Lei, TF |
| 國立交通大學 |
2014-12-08T15:41:01Z |
Highly reliable nickel silicide formation with a Zr capping layer
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Lee, TL; Lee, JW; Lee, MC; Lei, TF; Lee, CL |
| 國立交通大學 |
2014-12-08T15:40:24Z |
A one-step single-cleaning solution for CMOS processes
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Chao, TS; Yeh, CH; Pan, TM; Lei, TF; Li, YH |
| 國立交通大學 |
2014-12-08T15:40:13Z |
Characterization of temperature dependence for HfO2 gate dielectrics treated in NH3 plasma
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Wang, JC; Shie, DC; Lei, TF; Lee, CL |
| 國立交通大學 |
2014-12-08T15:40:06Z |
High reliability ultrathin interpolyoxynitride dielectrics prepared by N2O plasma annealing
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Wang, JC; Lee, JW; Kuo, LT; Lei, TF; Lee, CL |
| 國立交通大學 |
2014-12-08T15:40:05Z |
H-2 and NH3 plasma passivation on poly-Si TFTs with bottom-sub-gate induced electrical junctions
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Yu, CM; Lin, HC; Huang, TY; Lei, TF |
| 國立交通大學 |
2014-12-08T15:39:45Z |
Carrier transportation of rapid thermal annealed CeO2 gate dielectrics
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Wang, JC; Chiang, KC; Lei, TF; Lee, CL |
| 國立交通大學 |
2014-12-08T15:39:40Z |
Improved characteristics of ultrathin CeO2 by using postnitridation annealing
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Wang, JC; Hung, YP; Lee, CL; Lei, TF |
| 國立交通大學 |
2014-12-08T15:39:29Z |
Turnaround of hysterisis for capacitance-voltage characteristics of hafnium oxynitride dielectrics
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Wang, JC; Shie, DC; Lei, TF; Lee, CL |
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