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臺灣學術機構典藏系統 (Taiwan Academic Institutional Repository, TAIR)
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Institution Date Title Author
臺大學術典藏 2018-09-10T08:46:32Z Impact of process-effect correction strategies on variability of critical dimension and electrical characteristics in extreme ultraviolet lithography Ng, Sheng-Wei ; Chien, Bo-Sen ; Chang, Kuen-Yu ; Tsai*, Yi-Chang ; Lu, Jia-Han ; Li,Alek C.; ChenNg, Philip C.W.; Chien, Sheng-Wei; Chang, Bo-Sen; Tsai, Kuen-Yu; Lu, Yi-Chang; Li, Jia-Han; Chen, Alek C.; Ng, Philip C.W.; Chien, Sheng-Wei; Chang, Bo-Sen; Tsai, Kuen-Yu; Lu, Yi-Chang; Li, Jia-Han; Chen, Alek C.; YI-CHANG LU; KUEN-YU TSAI; Li, Jia-Han

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