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| 國立交通大學 |
2019-09-02T07:45:40Z |
Trapping and Detrapping of Oxide Border Traps in Al2O3 Gate Dielectric in MOS2 n-MOSFETs under PBTI Stress
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Yuan, Hui-Wen; Shen, Hui; Li, Jun-Jie; Shao, Jinhai; Huang, Daming; Chen, Yi-Fang; Wang, P. F.; Ding, S. J.; Chin, Albert; Li, Ming-Fu |
| 國立交通大學 |
2018-08-21T05:54:00Z |
PBTI Investigation of MoS2 n-MOSFET With Al2O3 Gate Dielectric
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Yuan, Hui-Wen; Shen, Hui; Li, Jun-Jie; Shao, Jinhai; Huang, Daming; Chen, Yi-Fang; Wang, P. F.; Ding, S. J.; Chin, Albert; Li, Ming-Fu |
| 國立交通大學 |
2017-04-21T06:56:31Z |
Investigation of Traps at MoS2/Al2O3 Interface in nMOSFETs by Low-Frequency Noise
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Yuan, Hui-Wen; Shen, Hui; Li, Jun-Jie; Shao, Jinhai; Huang, Daming; Chen, Yi-Fang; Wang, P. F.; Ding, S. J.; Liu, W. J.; Chin, Albert; Li, Ming-Fu |
| 國立交通大學 |
2014-12-08T15:13:09Z |
Work function tunability of refractory metal nitrides by lanthanum or aluminum doping for advanced CMOS devices
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Wang, Xin Peng; Lim, Andy Eu-Jin; Yu, Hong Yu; Li, Ming-Fu; Ren, Chi; Loh, WeiYip; Zhu, Chun Xiang; Chin, Albert; Trigg, Alastair David; Yeo, Yee-Chia; Biesemans, Serge; Lo, Guo-Qiang; Kwong, Dim-Lee |
| 國立臺灣大學 |
1993-09 |
A novel approach to output process characterization for token ring networks supporting priorities
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Li, Ming-fu; Tsai, Zse-hong |
Showing items 1-5 of 5 (1 Page(s) Totally)
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