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Institution Date Title Author
國立交通大學 2019-04-02T06:00:18Z Effects of base oxide thickness and silicon composition on charge trapping in HfSiO/SiO2 high-k gate stacks Wu, WH; Chen, MC; Tsui, BY; How, YT; Yao, LG; Jin, Y; Tao, HJ; Chen, SC; Liang, MS
國立交通大學 2014-12-08T15:46:37Z Reliability of ultrathin gate oxides for ULSI devices Chang, CY; Chen, CC; Lin, HC; Liang, MS; Chien, CH; Huang, TY
國立交通大學 2014-12-08T15:46:29Z Temperature-accelerated dielectric breakdown in ultrathin gate oxides Chen, CC; Chang, CY; Chien, CH; Huang, TY; Lin, HC; Liang, MS
國立交通大學 2014-12-08T15:46:14Z A new technique for hot carrier reliability evaluations of flash memory cell after long-term program/erase cycles Chung, SS; Yih, CM; Cheng, SM; Liang, MS
國立交通大學 2014-12-08T15:45:52Z Improved immunity to plasma damage in ultrathin nitrided oxides Chen, CC; Lin, HC; Chang, CY; Liang, MS; Chien, CH; Hsien, SK; Huang, TY
國立交通大學 2014-12-08T15:45:46Z Effects of polysilicon gate doping concentration on plasma charging damage in ultrathin gate oxides Chen, CC; Lin, HC; Chang, CY; Huang, TY; Chien, CH; Liang, MS
國立交通大學 2014-12-08T15:45:26Z Monte Carlo sphere model for effective oxide thinning induced extrinsic breakdown Huang, HT; Chen, MJ; Chen, JH; Su, CW; Hou, CS; Liang, MS
國立交通大學 2014-12-08T15:45:15Z Improved ultrathin gate oxide integrity in p(+)-polysilicon-gate p-channel metal oxide semiconductor with medium-dose fluorine implantation Chen, CC; Lin, HC; Chang, CY; Huang, TY; Chien, CH; Liang, MS
國立交通大學 2014-12-08T15:45:05Z Plasma-induced charging damage in ultrathin (3-nm) gate oxides Chen, CC; Lin, HC; Chang, CY; Liang, MS; Chien, CH; Hsien, SK; Huang, TY; Chao, TS
國立交通大學 2014-12-08T15:44:58Z Detection of the defects induced by boron high-energy ion implantation of silicon Hsu, WC; Chen, MC; Liang, MS

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