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机构 日期 题名 作者
國立交通大學 2019-04-02T05:58:33Z Mechanism of nitrogen coimplant for suppressing boron penetration in p(+)-polycrystalline silicon gate of p metal-oxide semiconductor field effect transistor Chao, TS; Liaw, MC; Chu, CH; Chang, CY; Chien, CH; Hao, CP; Lei, TF
國立交通大學 2014-12-08T15:45:06Z Novel cleaning solutions for polysilicon film post chemical mechanical polishing Pan, TM; Lei, TF; Chen, CC; Chao, TS; Liaw, MC; Yang, WL; Tsai, MS; Lu, CP; Chang, WH
國立交通大學 2014-12-08T15:44:47Z Optimum conditions for novel one-step cleaning method for pre-gate oxide cleaning using robust design methodology Pan, TM; Lei, TF; Chao, TS; Liaw, MC; Lu, CP
國立交通大學 2014-12-08T15:43:50Z One-step cleaning solution to replace the conventional RCA two-step cleaning recipe for pregate oxide cleaning Pan, TM; Lei, TF; Chao, TS; Liaw, MC; Ko, FH; Lu, CP
國立交通大學 2014-12-08T15:42:23Z Performance evaluation of cleaning solutions enhanced with tetraalkylammonium hydroxide substituents for post-CMP cleaning on poly-Si film Pan, TM; Lei, TF; Ko, FH; Chao, TS; Liaw, MC; Lee, YH; Lu, CP
國立交通大學 2014-12-08T15:02:21Z Mechanism of nitrogen coimplant for suppressing boron penetration in p(+)-polycrystalline silicon gate of p metal-oxide semiconductor field effect transistor Chao, TS; Liaw, MC; Chu, CH; Chang, CY; Chien, CH; Hao, CP; Lei, TF
國立交通大學 2014-12-08T15:01:56Z Suppression of boron penetration in P+-poly-Si gate metal-oxide-semiconductor transistor using nitrogen implantation Chao, TS; Chien, CH; Hao, CP; Liaw, MC; Chu, CH; Chang, CY; Lei, TF; Sun, WT; Hsu, CH

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