|
|
Taiwan Academic Institutional Repository >
Browse by Author
|
"lin chien ting"
Showing items 56-65 of 81 (9 Page(s) Totally)
<< < 1 2 3 4 5 6 7 8 9 > >>
View [10|25|50] records per page
| 國立高雄大學 |
2008-10 |
Significant improvement of 45 nm and beyond complementary metal oxide semiconductor field effect transistor performance with fully silicided and ultimate spacer process technology
|
Hsu, Chia-Wei; Fang, Yean-Kuen; Lin, Chien-Ting; Yeh, Wen-Kuan; Hsu, Che-Hua; Lai, Chieh-Ming; Cheng, Li-Wei; Ma, Mike |
| 國立成功大學 |
2008-09-01 |
Significant improvement of 45 nm and beyond complementary metal oxide semiconductor field effect transistor performance with fully silicided and ultimate spacer process technology
|
Hsu, Chia-Wei; Fang, Yean-Kuen; Lin, Chien-Ting; Yeh, Wen-Kuan; Hsu, Che-Hua; Lai, Chieh-Ming; Cheng, Li-Wei; Ma, Mike |
| 國立高雄大學 |
2008-07 |
Significantly improving sub-90 nm CMOSFET performances with notch-gate enhanced high tensile-stress contact etch stop layer
|
Hsu, Chia-Wei; Fang, Yean-Kuen; Yeh, Wen-Kuan; Lin, Chien-Ting |
| 國立成功大學 |
2008-04 |
Effect of etch stop layer stress on negative bias temperature instability of deep submicron p-type metal-oxide-semiconductor field effect transistors with dual gate oxide
|
Chen, Ming-Shing; Fang, Yean-Kuen; Lee, Tung-Hsing; Lin, Chien-Ting; Chiang, Yen-Ting; Ko, Joe; Sheu, Yau Kae; Shen, Tsong Lin; Liao, Wen Yi |
| 國立高雄大學 |
2008 |
The impact of stain technology on FUSI gate SOI CMOSFET and device performance enhancement for 45nm node and beyond
|
Yeh, Wen-Kuan; Wang, Jean-An; Lin, Chien-Ting; Cheng, Li-Wei; Ma, Mike |
| 國立成功大學 |
2007-12-07 |
先進應變工程及完全金屬矽化閘極應用於奈米金氧半電晶體的之研究
|
林建廷; Lin, Chien-Ting |
| 國立成功大學 |
2007-12-07 |
先進應變工程及完全金屬矽化閘極應用於奈米金氧半電晶體的之研究
|
林建廷; Lin, Chien-Ting |
| 國立成功大學 |
2007-09 |
CMOS dual-work-function engineering by using implanted Ni-FUSI
|
Lin, Chien-Ting; Ramin, Manfred; Pas, Michael; Wise, Rick; Fang, Yean-Kuen; Hsu, Che-Hua; Huang, Yao-Tsung; Cheng, Li-Wei; Ma, Mike |
| 國立成功大學 |
2007-07-19 |
市場條件對投資人處份效果之影響
|
林建廷; Lin, Chien-Ting |
| 國立高雄大學 |
2007-05 |
Impacts of notched-gate structure on contact etch stop layer (CESL) stressed 90-nm nMOSFET
|
Lin, Chien-Ting; Fang, Yean-Kuen; Yeh, Wen-Kuan; Lai, Chieh-Ming; Hsu, Che-Hua; Cheng, Li-Wei; Ma, Guang-Hwa |
Showing items 56-65 of 81 (9 Page(s) Totally)
<< < 1 2 3 4 5 6 7 8 9 > >>
View [10|25|50] records per page
|
