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Showing items 56-80 of 81 (4 Page(s) Totally)
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| 國立高雄大學 |
2008-10 |
Significant improvement of 45 nm and beyond complementary metal oxide semiconductor field effect transistor performance with fully silicided and ultimate spacer process technology
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Hsu, Chia-Wei; Fang, Yean-Kuen; Lin, Chien-Ting; Yeh, Wen-Kuan; Hsu, Che-Hua; Lai, Chieh-Ming; Cheng, Li-Wei; Ma, Mike |
| 國立成功大學 |
2008-09-01 |
Significant improvement of 45 nm and beyond complementary metal oxide semiconductor field effect transistor performance with fully silicided and ultimate spacer process technology
|
Hsu, Chia-Wei; Fang, Yean-Kuen; Lin, Chien-Ting; Yeh, Wen-Kuan; Hsu, Che-Hua; Lai, Chieh-Ming; Cheng, Li-Wei; Ma, Mike |
| 國立高雄大學 |
2008-07 |
Significantly improving sub-90 nm CMOSFET performances with notch-gate enhanced high tensile-stress contact etch stop layer
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Hsu, Chia-Wei; Fang, Yean-Kuen; Yeh, Wen-Kuan; Lin, Chien-Ting |
| 國立成功大學 |
2008-04 |
Effect of etch stop layer stress on negative bias temperature instability of deep submicron p-type metal-oxide-semiconductor field effect transistors with dual gate oxide
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Chen, Ming-Shing; Fang, Yean-Kuen; Lee, Tung-Hsing; Lin, Chien-Ting; Chiang, Yen-Ting; Ko, Joe; Sheu, Yau Kae; Shen, Tsong Lin; Liao, Wen Yi |
| 國立高雄大學 |
2008 |
The impact of stain technology on FUSI gate SOI CMOSFET and device performance enhancement for 45nm node and beyond
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Yeh, Wen-Kuan; Wang, Jean-An; Lin, Chien-Ting; Cheng, Li-Wei; Ma, Mike |
| 國立成功大學 |
2007-12-07 |
先進應變工程及完全金屬矽化閘極應用於奈米金氧半電晶體的之研究
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林建廷; Lin, Chien-Ting |
| 國立成功大學 |
2007-12-07 |
先進應變工程及完全金屬矽化閘極應用於奈米金氧半電晶體的之研究
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林建廷; Lin, Chien-Ting |
| 國立成功大學 |
2007-09 |
CMOS dual-work-function engineering by using implanted Ni-FUSI
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Lin, Chien-Ting; Ramin, Manfred; Pas, Michael; Wise, Rick; Fang, Yean-Kuen; Hsu, Che-Hua; Huang, Yao-Tsung; Cheng, Li-Wei; Ma, Mike |
| 國立成功大學 |
2007-07-19 |
市場條件對投資人處份效果之影響
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林建廷; Lin, Chien-Ting |
| 國立高雄大學 |
2007-05 |
Impacts of notched-gate structure on contact etch stop layer (CESL) stressed 90-nm nMOSFET
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Lin, Chien-Ting; Fang, Yean-Kuen; Yeh, Wen-Kuan; Lai, Chieh-Ming; Hsu, Che-Hua; Cheng, Li-Wei; Ma, Guang-Hwa |
| 國立成功大學 |
2007-05 |
Impacts of notched-gate structure on contact etch stop layer (CESL) stressed 90-nm nMOSFET
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Lin, Chien-Ting; Fang, Yean-Kuen; Yeh, Wen-Kuan; Lai, Chieh-Ming; Hsu, Che-Hua; Cheng, Li-Wei; Ma, Guang-Hwa |
| 國立高雄大學 |
2007-04-30 |
Efficient mobility enhancement engineering on 65 nm fully silicide complementary metal-oxide-semiconductor field-effect-transistors using second contect etch stop layer process
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Lai, Chieh-Ming; Fang, Yean-Kuen; Lin, Chien-Ting; Yeh, Wen-Kuan |
| 國立成功大學 |
2007-04 |
Efficient mobility enhancement engineering on 65 nm fully silicide complementary metal-oxide-semiconductor field-effect-transistors using second contect etch stop layer process
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Lai, Chieh-Ming; Fang, Yean-Kuen; Lin, Chien-Ting; Yeh, Wen-Kuan |
| 國立成功大學 |
2007-04 |
Extra bonus on transistor optimization with stress enhanced notched-gate technology for sub-90 nm complementary metal oxide semiconductor field effect transistor
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Lin, Chien-Ting; Fang, Yean-Kuen; Lai, Chieh-Ming; Yeh, Wen-Kuan; Hsu, Che-Hua; Cheng, Li-Wei; Huang, Yao-Tsung; Ma, Guang Hwa |
| 淡江大學 |
2007-03 |
Practice makes better? A study of meditation learners in a classroom environment
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Lin, Chin-yen; Kuo, Tsung-hsien; Kuo, Yen-ku; Kuo, Yen-lin; 何俐安; Ho, Li-an; Lin, Chien-ting |
| 國立高雄大學 |
2007-02 |
A novel strain method for enhancement of 90-nm node and beyond FUSI-gated CMOS performance
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Lin, Chien-Ting; Fang, Yean-Kuen; Yeh, Wen-Kuan; Lee, Tung-Hsing; Chen, Ming-Shing; Lai, Chieh-Ming; Hsu, Che-Hua; Chen, Liang-Wei; Cheng, Li-Wei; Ma, Mike |
| 國立高雄大學 |
2007-02 |
The investigation of post-annealing-induced defects behavior on 90-nm in halo nMOSFETs with low-frequency noise and charge-pumping measuring
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Lai, Chieh-Ming; Fang, Yean-Kuen; Yeh, Wen-Kuan; Lin, Chien-Ting; Chou, T.H. |
| 國立成功大學 |
2007-02 |
A novel strain method for enhancement of 90-nm node and beyond FUSI-gated CMOS performance
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Lin, Chien-Ting; Fang, Yean-Kuen; Yeh, Wen-Kuan; Lee, Tung-Hsing; Chen, Ming-Shing; Lai, Chieh-Ming; Hsu, Che-Hua; Chen, Liang-Wei; Cheng, Li-Wei; Ma, Mike |
| 國立成功大學 |
2006-12 |
Effect of silicon thickness on contact-etch-stop-layer-induced silicon/buried-oxide interface stress for partially depleted SOI
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Lin, Chien-Ting; Fang, Yean-Kuen; Yeh, Wen-Kuan; Lee, Tung-Hsing; Chen, Ming-Shing; Hsu, Che-Hua; Chen, Liang-Wei; Cheng, Li-Wei; Ma, Mike |
| 國立成功大學 |
2006-11 |
The geometry effect of contact etch stop layer impact on device performance and reliability for 90-nm SOI nMOSFETs
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Lai, Chieh-Ming; Fang, Yean-Kuen; Lin, Chien-Ting; Yeh, Wen-Kuan |
| 國立成功大學 |
2006-06 |
The impacts of high tensile stress CESL and geometry design on device performance and reliability for 90 nm SOI nMOSFETs
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Lai, Chieh-Ming; Fang, Yean-Kuen; Lin, Chien-Ting; Hsu, Chia-Wei; Yeh, Wen-Kuan |
| 淡江大學 |
2006-05 |
The role of IT, learning motivation and knowledge sourcing in knowledge management
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Ho, Li-an; Lin, Chin-yen; Kuo, Tsung-hsien; Kuo, Yen-ku; Lin, Chien-ting |
| 國立成功大學 |
2006-04 |
Investigation and modeling of stress interactions on 90 nm silicon on insulator complementary metal oxide semiconductor by various mobility enhancement approaches
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Lin, Chien-Ting; Fang, Yean-Kuen; Yeh, Wen-Kuan; Lee, Tung-Hsing; Chen, Ming-Hing; Hsu, Che-Hua; Chen, Liang-Wei; Chang, Hui-Chen; Tsai, Cheng-Tzung; Ma, Mike |
| 國立高雄大學 |
2006 |
The impact of stress enhanced technology for sub-90nm SOI MOSFETs
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Yeh, Wen-Kuan; Lai, Chieh-Ming; Lin, Chien-Ting; Fang, Yean-Kuen |
| 國立高雄大學 |
2005 |
Stress technology impact on device performance and reliability for <100> sub-90nm SOI CMOSFETs
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Yeh, Wen-Kuan; Lai, Chieh-Ming; Lin, Chien-Ting; Fang, Yean-Kuen; Shiau, W.T. |
Showing items 56-80 of 81 (4 Page(s) Totally)
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