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Showing items 126-135 of 324 (33 Page(s) Totally)
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| 國立交通大學 |
2014-12-08T15:43:47Z |
Reactively sputtered amorphous TaSixNy films serving as barrier layer against copper diffusion
|
Lin, CL; Ku, SR; Chen, MC |
| 國立交通大學 |
2014-12-08T15:43:14Z |
Electronic properties of phosphorus-doped triode-type diamond field emission arrays
|
Chen, CF; Tsai, CL; Lin, CL |
| 國立交通大學 |
2014-12-08T15:43:13Z |
Characterization of phosphorus-doped and boron-doped diamond-like carbon emitter arrays
|
Tsai, CL; Chen, CF; Lin, CL |
| 國立交通大學 |
2014-12-08T15:43:05Z |
Chemically vapor deposited Cu films on Ar-plasma-treated TiN substrate
|
Lin, CL; Chen, PS; Chen, MC |
| 國立交通大學 |
2014-12-08T15:42:57Z |
Phase behavior and hydrogen bonding in ternary polymer blends of phenolic resin/poly(ethylene oxide)/poly(epsilon-caprolactone)
|
Kuo, SW; Lin, CL; Chang, FC |
| 國立交通大學 |
2014-12-08T15:42:52Z |
Hot filament for in situ catalyst supply in the chemical vapor deposition growth of carbon nanotubes
|
Chen, CF; Lin, CL; Wang, CM |
| 國立交通大學 |
2014-12-08T15:42:45Z |
Study of carbon nanoemitters using CO2-CH4 gas mixtures in triode-type field emission arrays
|
Chen, CF; Tsai, CL; Lin, CL |
| 國立交通大學 |
2014-12-08T15:42:39Z |
Field emission from well-aligned carbon nanotips grown in a gated device structure
|
Tsai, CL; Chen, CF; Lin, CL |
| 國立交通大學 |
2014-12-08T15:42:29Z |
Effects of TaN substrate pretreatment by Ar plasma on copper chemical vapor deposition
|
Lin, CL; Chen, PS; Chen, MC |
| 國立交通大學 |
2014-12-08T15:42:28Z |
Effects of the underlayer substrates on copper chemical vapor deposition
|
Lin, CL; Chen, PS; Chen, MC |
Showing items 126-135 of 324 (33 Page(s) Totally)
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