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Showing items 1-7 of 7 (1 Page(s) Totally)
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| 國立交通大學 |
2014-12-08T15:46:40Z |
Applications of total reflection X-ray fluorescence to analysis of VLSI micro contamination
|
Liou, BW; Lee, CL |
| 國立交通大學 |
2014-12-08T15:46:01Z |
Variations of X-ray spectrum in total reflection X-ray fluorescence (TXRF) analysis with respect to Si wafer crystal orientation for different incident angles
|
Liou, BW; Lee, CL |
| 國立交通大學 |
2014-12-08T15:45:26Z |
Characteristics of high breakdown voltage Schottky barrier diodes using p(+)-polycrystalline-silicon diffused-guard-ring
|
Liou, BW; Lee, CL |
| 國立交通大學 |
2014-12-08T15:44:31Z |
Plasma effects of fluorine implantation on As+-doped polycrystalline silicon thin films of various thicknesses
|
Liou, BW; Lee, CL |
| 國立交通大學 |
2014-12-08T15:03:22Z |
THICKNESS EFFECT ON HYDROGEN PLASMA TREATMENT ON POLYCRYSTALLINE SILICON THIN-FILMS
|
LIOU, BW; WU, YH; LEE, CL; LEI, TF |
| 國立交通大學 |
2014-12-08T15:03:07Z |
HIGH BREAKDOWN VOLTAGE SCHOTTKY-BARRIER DIODE USING P(+)-POLYCRYSTALLINE SILICON DIFFUSED GUARD RING
|
LIOU, BW; LEE, CL; LEI, TF |
| 國立交通大學 |
2014-12-08T15:01:44Z |
Hydrogen and oxygen plasma effects on polycrystalline silicon thin films of various thicknesses
|
Liou, BW; Lee, CL; Lei, TF; Wu, YH |
Showing items 1-7 of 7 (1 Page(s) Totally)
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