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Institution Date Title Author
國立交通大學 2014-12-08T15:46:40Z Applications of total reflection X-ray fluorescence to analysis of VLSI micro contamination Liou, BW; Lee, CL
國立交通大學 2014-12-08T15:46:01Z Variations of X-ray spectrum in total reflection X-ray fluorescence (TXRF) analysis with respect to Si wafer crystal orientation for different incident angles Liou, BW; Lee, CL
國立交通大學 2014-12-08T15:45:26Z Characteristics of high breakdown voltage Schottky barrier diodes using p(+)-polycrystalline-silicon diffused-guard-ring Liou, BW; Lee, CL
國立交通大學 2014-12-08T15:44:31Z Plasma effects of fluorine implantation on As+-doped polycrystalline silicon thin films of various thicknesses Liou, BW; Lee, CL
國立交通大學 2014-12-08T15:03:22Z THICKNESS EFFECT ON HYDROGEN PLASMA TREATMENT ON POLYCRYSTALLINE SILICON THIN-FILMS LIOU, BW; WU, YH; LEE, CL; LEI, TF
國立交通大學 2014-12-08T15:03:07Z HIGH BREAKDOWN VOLTAGE SCHOTTKY-BARRIER DIODE USING P(+)-POLYCRYSTALLINE SILICON DIFFUSED GUARD RING LIOU, BW; LEE, CL; LEI, TF
國立交通大學 2014-12-08T15:01:44Z Hydrogen and oxygen plasma effects on polycrystalline silicon thin films of various thicknesses Liou, BW; Lee, CL; Lei, TF; Wu, YH

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