|
"liu chuan pu"的相關文件
顯示項目 146-155 / 168 (共17頁) << < 8 9 10 11 12 13 14 15 16 17 > >> 每頁顯示[10|25|50]項目
| 國立成功大學 |
2004-09 |
Direct COSi2 thin-film formation with homogeneous nanograin-size distribution by oxide-mediated silicidation
|
Chang, Juin-Jie; Liu, Chuan-Pu; Chen, Shih-Wei; Chang, Chih-Chia; Hsieh, Tsung-Eong; Wang, Ying-Lang |
| 國立成功大學 |
2004-09 |
Influence of substrate bias on practical adhesion, toughness, and roughness of reactive dc-sputtered zirconium nitride films
|
Chen, Cheng-Shi; Liu, Chuan-Pu; Yang, Heng-Ghieh; Tsao, C. Y. A. |
| 國立成功大學 |
2004-05 |
Influence of the preferred orientation and thickness of zirconium nitride films on the diffusion property in copper
|
Chen, Cheng-Shi; Liu, Chuan-Pu; Yang, Heng-Ghieh; Tsao, Chi Y. A. |
| 國立成功大學 |
2004-03 |
Synthesis of cobalt nanoparticles by DC magnetron sputtering and the effects of electron bombardment
|
Chung, Bing-Xian; Liu, Chuan-Pu |
| 國立成功大學 |
2004-01-30 |
Monitor and eliminate the circular defects in HDP-STI deposition through oxynitride/oxide composite liner
|
Lan, Jin-Kun; Wang, Ying-Lang; Liu, Chuan-Pu; Lee, Wen-His; Ay, Chyung; Cheng, Yi-Lung; Chang, Shih-Chieh |
| 國立成功大學 |
2004-01-30 |
Evaluation of advanced chemical mechanical planarization techniques for copper damascene interconnect
|
Chen, K. W.; Wang, Y. L.; Liu, Chuan-Pu; Yang, K.; Chang, L.; Lo, K. Y.; Liu, C. W. |
| 國立成功大學 |
2004-01-30 |
Study on precipitations of fluorine-doped silicon oxide
|
Wu, Jun; Wang, Ying-Lang; Liu, Chuan-Pu; Chang, Shih-Chieh; Kuo, Cheng-Tzu; Ay, Chyung |
| 國立成功大學 |
2004-01-30 |
Fluorine-modified low-k a-SiOC : H composite films prepared by plasma enhanced chemical vapor deposition
|
JangJean, Shiuh-Ko; Liu, Chuan-Pu; Wang, Ying-Lang; Hwang, Weng-Sing; Tseng, Wei-Tsu; Chen, Sheng-Wen; Lo, Kuang-Yao |
| 國立成功大學 |
2004-01-30 |
Moisture resistance and thermal stability of fluorine-incorporation siloxane-based low-dielectric-constant material
|
Cheng, Y. L.; Wang, Y. L.; Wu, Y. L.; Liu, Chuan-Pu; Liu, C. W.; Lan, J. K.; O'Neil, M. L.; Ay, Chyung; Feng, M. S. |
| 國立成功大學 |
2003-11-15 |
The application of electrochemical metrologies for investigating chemical mechanical polishing of Al with a Ti barrier layer
|
Chiu, Shao-Yu; Wang, Ying-Lang; Liu, Chuan-Pu; Lan, Jin-Kun; Ay, Chyung; Feng, Ming-Shiann; Tsai, Ming-Shih; Dai, Bau-Tong |
顯示項目 146-155 / 168 (共17頁) << < 8 9 10 11 12 13 14 15 16 17 > >> 每頁顯示[10|25|50]項目
|