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Showing items 1-13 of 13  (1 Page(s) Totally)
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Institution Date Title Author
國立交通大學 2019-04-02T05:59:11Z Pulsed KrF laser annealing of Ni/Si0.76Ge0.24 films Luo, JS; Lin, WT; Chang, CY; Tsai, WC
國立交通大學 2014-12-08T15:48:54Z Interfacial reactions of Ni on Si0.76Ge0.24 and Si by pulsed laser annealing Luo, JS; Lin, WT; Chang, CY; Tsai, WC
國立交通大學 2014-12-08T15:48:43Z Interfacial reactions of Pd/Si0.76Ge0.24 by pulsed KrF laser annealing Chen, DR; Luo, JS; Lin, WT; Chang, CY; Shih, PS
國立交通大學 2014-12-08T15:46:32Z Room temperature oxidation of Cu/Si0.76Ge0.24 annealed at 200 to 300 degrees C Luo, JS; Lin, WT; Chang, CY; Shih, PS
國立交通大學 2014-12-08T15:46:22Z Characterization of Si1-x-yGexCy films grown by C+ implantation and subsequent pulsed laser annealing Luo, JS; Lin, WT; Chang, CY; Shih, PS; Pan, FM; Chang, TC
國立交通大學 2014-12-08T15:46:21Z Interfacial reactions of Co/Si0.76Ge0.24 and Co(Si0.76Ge0.24)/Si0.76Ge0.24 by pulsed KrF laser annealing Luo, JS; Hang, YL; Lin, WT; Chang, CY; Shih, PS
國立交通大學 2014-12-08T15:46:02Z Effects of Mo-free C40Ti(Si1-xGex)(2) precursors and the thickness of an interposed Mo layer on the enhanced formation of C54Ti(Si1-xGex)(2) Luo, JS; Huang, JC; Lin, WT; Chang, CY; Shih, PS
國立交通大學 2014-12-08T15:45:53Z Annealing effects on the interfacial reactions of Ni on Si0.76Ge0.24 and Si1-x-yGexCy Luo, JS; Lin, WT; Chang, CY; Shih, PS; Pan, FM
國立交通大學 2014-12-08T15:45:14Z Interfacial reactions of Ni/Si0.76Ge0.24 and Ni/Si1-x-yGexCy by vacuum annealing and pulsed KrF laser annealing Luo, JS; Lin, WT; Chang, CY; Shih, PS
國立交通大學 2014-12-08T15:45:14Z Pulsed KrF laser annealing of Mo/Si0.76Ge0.24 Luo, JS; Lin, WT; Chang, CY; Shih, PS; Chang, TC
國立交通大學 2014-12-08T15:44:46Z Effects of an interposed Mo layer on the interfacial reactions of Ti/Si0.76Ge0.24 by rapid thermal annealing and pulsed laser annealing Huang, JC; Luo, JS; Lin, WT; Chang, CY; Shih, PS
國立交通大學 2014-12-08T15:01:52Z Interfacial reactions of the Co/Si1-xGex system Luo, JS; Lin, WT; Chang, CY; Tsai, WC; Wang, SJ
國立交通大學 2014-12-08T15:01:24Z Pulsed KrF laser annealing of Ni/Si0.76Ge0.24 films Luo, JS; Lin, WT; Chang, CY; Tsai, WC

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