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Showing items 131-158 of 158  (4 Page(s) Totally)
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Institution Date Title Author
國立中山大學 1988 Characterization of InP/GaAs Epilayers Grown on Si Substrates by Low-Pressure Organometallic Chemical Vapor Phase Epitaxy M.K. Lee; D.S. Wuu; H.H. Tung; K.Y. Yu; K.C. Huang
國立中山大學 1988 MOCVD Growth of InP on Si by Using a GaAs Buffer Layer M.K. Lee;D.S. Wuu;H.H. Tung;K.Y. Yu;K.C. Huang
國立中山大學 1988 Heteroepitaxial Grown of ZnSe on GaAs/Si Substrates by Low-Pressure Metalorganic Chemical Vapor Deposition M.K. Lee;J.H. Chang;M.Y. Yeh;Y.F. Lin;K.C. Huang
國立中山大學 1988 Heteroepitaxial Growth of ZnSe on (111)Si by Low-Pressure Metalorganic Chemical Vapor Deposition M.K. Lee;J.H. Chang;M.Y. Yeh;K.C. Huang
國立中山大學 1988 Organometallic growth and Material Properties of InP-on-Si M.K. Lee;D.S. Wuu;H.H. Tung;R.H. Horng;K.C. Huang
國立中山大學 1987 ZnSe Thin Film Prepared by Metal-Organic Chemical Vapor Deposition M.K. Lee
國立中山大學 1987 Low Pressure Metalorganic Vapor Phase Epitaxy of InP Using a Trimethylindium- Trimethylphosphine Adduct Source M.K. Lee; D.S. Wuu; H.H. Tung
國立中山大學 1987 Heteroepitaxial Growth of InP on GaAs by Low-Pressure Metalorganic Chemical Vapor Deposition M.K. Lee; D.S. Wuu; H.H. Tung
國立中山大學 1987 Gallium Arsenide Growth on Silicon From Triethylgallium and Arsine by Metalorganic Chemical Vapor Deposition M.K. Lee;K.Y. Yu;Y.F. Lin
國立中山大學 1987 Epitaxial Growth of Indium Phosphide on GaAs by Low Pressure Metalorganic Chemical Vapor Deposition M.K. Lee; D.S. Wuu; H.H. Tung
國立中山大學 1987 Heteroepitaxial Growth of InP Directly on Si by Low Pressure Metalorganic Chemical Vapor Depositions M.K. Lee; D.S. Wuu; H.H. Tung
國立中山大學 1987 Gallium Arsenide Grown on Silicon From Trimethylgallium and Arsine by Metalorganic Chemical Vapor Deposition M.K. Lee;K.Y. Yu;Y.F. Lin;J.H. Chang;K.C. Hwang
國立中山大學 1987 Vapor Phase Epitaxy of Indium Phosphide Using Metalorganic Adduct Compound M.K. Lee;D.S. Wu;H.H. Tung
國立中山大學 1987 InP Epitaxial Growth by Low Pressure Metalorganic Chemical Vapor Deposition Using Adduct Source M.K. Lee;D.S. Wu;H.H. Tung
國立中山大學 1986 Tin-Doped GaAs Epilayers Grown by Low Pressure Metalorganic Chemical Vapor Deposition Using Triethylgallium and Tetraethyltin M.K. Lee; Y.C. Chang
國立中山大學 1986 Growth and Characterization of ZnSe Epilayers by Low Pressure MOCVD M.K. Lee
國立中山大學 1986 Low Cost ZnSe Thin Film Prepared by Organometallic Chemical Vapor Deposition M.K. Lee
國立中山大學 1984 Growth Mechanisms of the GaAs LPMOCVD Growth C.Y. Chang;M.K. Lee;Y.K. Su;Y.C. Chou;L.P. Chen
國立中山大學 1983 Enhancement of Growth Rate due to Tin Doping in GaAs Epilayer Grown by Low Pressure Metalorgarlic Chemical Vapor Deposition M.K. Lee; C.Y. Chang; Y.K. Su; W.C. Hsu
國立中山大學 1983 Control of Silicon Dioxide Properties by RF Sputtering M.K. Lee; C.Y. Chang; I.S. Tzeng; Y.K. Su
國立中山大學 1983 Investigation of Sn-doped GaAs Epilayers Grown by Low Pressure Metal-Organic Chemical Vapor Deposition M.K. Lee; C.Y. Chang; Y.K. Su
國立中山大學 1982-10 Sn-doped GaAs Epilayers Grown by Low Pressure MOCVD C.Y. Chang;M.K. Lee;Y.K. Su
國立中山大學 1982 Two Region Associated with Transverse Field Characteristic Model of GaAs MESFET M.K. Lee;C.Y. Chang;Y.K. Su
國立中山大學 1982 A Method for Growing Sn-doped Gays Epilayers by Low Pressure MOCVD C.Y. Chang;M.K. Lee;Y.K. Su;T.S. Wu
國立中山大學 1981 Characterization of GaAs Epitaxial Layers by Low Pressure MOVPE Using TEG as Ga Source C.Y. Chang; Y.K. Su; M.K. Lee; M.P. Houng
國立中山大學 1981 Growth and Properties of GaP/Si Device by MOCVD Y.K. Su;C.Y. Chang;T.S. Wu;M.K. Lee;M.P. Houng;L.G. Chen
國立中山大學 1981 Properties of Sn-doped GaAs Epitaxial Layers by Low Pressure MOCVD M.K. Lee;C.Y. Chang;Y.K. Su
國立中山大學 1979 A New Method of SiO2 Film Deposition by Sputtering M.K. Lee;J.S. Tzeng;C.Y. Chang

Showing items 131-158 of 158  (4 Page(s) Totally)
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