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Institution Date Title Author
臺大學術典藏 2018-09-10T07:09:04Z Dry Etching of Si Field Emitters and High Aspect Ratio Resonators Using an Inductively Coupled Plasma Source M. R. Rakhsh; ehroo; J. W. Weigold; W. -C. Tian; S. W. Pang; WEI-CHENG TIAN

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