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Institution Date Title Author
國立臺灣海洋大學 2001-07 The Effect of Remote Plasma Nitridation on the Integrity of the Ultrathin Gate Dielectric Films in 0.13 m CMOS Technology and Beyond S.F. Ting; Y.K. Fang; C.H. Chen; C.W. Yang; W.T. Hsieh; J.J. Ho; M.C. Yu; S.M. Jang; C.H. Yu; M.S. Liang; S. Chen; R. Shih
國立臺灣海洋大學 1998-11 Narrow Width Effects of Bottom-Gate Polysilicon Thin Film Transistors D.N. Yaung; Y.K. Fang; K.C. Hwang; K.Y. Lee; K.H. Wu; J.J. Ho; C.Y. Chen; Y.J. Wang; M.S. Liang; J.Y. Lee; S.G. Wuu

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