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Showing items 1-19 of 19 (1 Page(s) Totally)
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| 國立交通大學 |
2019-04-02T05:58:28Z |
Photoluminescence from ordered and disordered Si-SiGe superlattices
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Chang, TC; Yeh, WK; Mei, YJ; Tsai, WC; Chen, YF |
| 國立交通大學 |
2014-12-08T15:46:15Z |
Effects of H-2 plasma treatment on low dielectric constant methylsilsesquioxane
|
Chang, TC; Liu, PT; Mei, YJ; Mor, YS; Perng, TH; Yang, YL; Sze, SM |
| 國立交通大學 |
2014-12-08T15:43:16Z |
Enhancing the resistance of low-k hydrogen silsesquioxane (HSQ) to wet stripper damage
|
Chang, TC; Mor, YS; Liu, PT; Tsai, TM; Chen, CW; Mei, YJ; Sze, SM |
| 國立交通大學 |
2014-12-08T15:43:16Z |
The effect of ammonia plasma treatment on low-k methyl-hybrido-silsesquioxane against photoresist stripping damage
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Chang, TC; Mor, YS; Liu, PT; Tsai, TM; Chen, CW; Mei, YJ; Sze, SM |
| 國立交通大學 |
2014-12-08T15:43:16Z |
Improvement of low dielectric constant methylsilsesquioxane by boron implantation treatment
|
Chang, TC; Mor, YS; Liu, PT; Tsai, TM; Chen, CW; Sze, SM; Mei, YJ |
| 國立交通大學 |
2014-12-08T15:43:11Z |
Effectiveness of NH3 plasma treatment in preventing wet stripper damage to low-k hydrogen silsesquioxane (HSQ)
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Chang, TC; Mor, YS; Liu, PT; Tsai, TM; Chen, CW; Mei, YJ; Sze, SM |
| 國立交通大學 |
2014-12-08T15:42:32Z |
Preventing dielectric damage of low-k organic siloxane by passivation treatment
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Chang, TC; Mor, YS; Liu, PT; Tsai, TM; Chen, CW; Mei, YJ; Pan, FM; Wu, WF; Sze, SM |
| 國立交通大學 |
2014-12-08T15:42:15Z |
Eliminating dielectric degradation of low-k organosilicate glass by trimethylchlorosilane treatment
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Chang, TC; Liu, PT; Mor, YS; Tsai, TM; Chen, CW; Mei, YJ; Pan, FM; Wu, WF; Sze, SM |
| 國立交通大學 |
2014-12-08T15:42:08Z |
Recovering dielectric loss of low dielectric constant organic siloxane during the photoresist removal process
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Chang, TC; Mor, YS; Liu, PT; Tsai, TM; Chen, CW; Mei, YJ; Sze, SM |
| 國立交通大學 |
2014-12-08T15:41:39Z |
The novel pattern method of low-k hybrid-organic-siloxane-polymer film using X-ray exposure
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Chang, TC; Tsai, TM; Liu, PT; Mor, YS; Chen, CW; Mei, YJ; Sheu, JT; Tseng, TY |
| 國立交通大學 |
2014-12-08T15:27:38Z |
Thermal stability and interaction between SiOF and Cu film
|
Mei, YJ; Chang, TC; Sheu, JD; Yeh, WK; Pan, FM; Chang, CY |
| 國立交通大學 |
2014-12-08T15:27:37Z |
Anomalous selective tungsten growth by chemical vapor deposition
|
Mei, YJ; Chang, TC; Sheu, JD; Yeh, WK; Pan, FM; Chang, CY |
| 國立交通大學 |
2014-12-08T15:04:15Z |
BOLOMETRIC RESPONSE OF HIGH-TEMPERATURE SUPERCONDUCTING THIN-FILMS
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MEI, YJ; WANG, MW; HSIEH, WK; CHANG, CY; HUANG, CJ; TSENG, TY |
| 國立交通大學 |
2014-12-08T15:02:53Z |
Light emission from the porous boron delta-doped Si superlattice
|
Chang, TC; Yeh, WK; Hsu, MY; Chang, CY; Lee, CP; Jung, TG; Tsai, WC; Huang, GW; Mei, YJ |
| 國立交通大學 |
2014-12-08T15:02:52Z |
Disordered Si/SiGe superlattices grown by ultrahigh vacuum chemical vapor deposition
|
Chang, TC; Yeh, WK; Chang, CY; Jung, TG; Tsai, WC; Huang, GW; Mei, YJ |
| 國立交通大學 |
2014-12-08T15:02:43Z |
Uniformity of epilayer grown by ultrahigh-vacuum chemical vapor deposition
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Chang, TC; Yeh, WK; Chang, CY; Jung, TG; Tsai, WC; Huang, GW; Mei, YJ |
| 國立交通大學 |
2014-12-08T15:02:21Z |
Photoluminescence from ordered and disordered Si-SiGe superlattices
|
Chang, TC; Yeh, WK; Mei, YJ; Tsai, WC; Chen, YF |
| 國立交通大學 |
2014-12-08T15:01:23Z |
Characterization of TiN film grown by low-pressure-chemical-vapor-deposition
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Mei, YJ; Chang, TC; Hu, JC; Chen, LJ; Yang, YL; Pan, FM; Wu, WF; Ting, A; Chang, CY |
| 國立交通大學 |
2014-12-08T15:01:22Z |
Stabilizing dielectric constant of fluorine-doped SiO2 film by N2O and NH3 plasma post-treatment
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Mei, YJ; Chang, TC; Chang, SJ; Pan, FM; Chen, MSK; Tuan, A; Chou, S; Chang, CY |
Showing items 1-19 of 19 (1 Page(s) Totally)
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