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臺灣學術機構典藏系統 (Taiwan Academic Institutional Repository, TAIR)
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Institution Date Title Author
國立交通大學 2019-04-02T05:58:28Z Photoluminescence from ordered and disordered Si-SiGe superlattices Chang, TC; Yeh, WK; Mei, YJ; Tsai, WC; Chen, YF
國立交通大學 2014-12-08T15:46:15Z Effects of H-2 plasma treatment on low dielectric constant methylsilsesquioxane Chang, TC; Liu, PT; Mei, YJ; Mor, YS; Perng, TH; Yang, YL; Sze, SM
國立交通大學 2014-12-08T15:43:16Z Enhancing the resistance of low-k hydrogen silsesquioxane (HSQ) to wet stripper damage Chang, TC; Mor, YS; Liu, PT; Tsai, TM; Chen, CW; Mei, YJ; Sze, SM
國立交通大學 2014-12-08T15:43:16Z The effect of ammonia plasma treatment on low-k methyl-hybrido-silsesquioxane against photoresist stripping damage Chang, TC; Mor, YS; Liu, PT; Tsai, TM; Chen, CW; Mei, YJ; Sze, SM
國立交通大學 2014-12-08T15:43:16Z Improvement of low dielectric constant methylsilsesquioxane by boron implantation treatment Chang, TC; Mor, YS; Liu, PT; Tsai, TM; Chen, CW; Sze, SM; Mei, YJ
國立交通大學 2014-12-08T15:43:11Z Effectiveness of NH3 plasma treatment in preventing wet stripper damage to low-k hydrogen silsesquioxane (HSQ) Chang, TC; Mor, YS; Liu, PT; Tsai, TM; Chen, CW; Mei, YJ; Sze, SM
國立交通大學 2014-12-08T15:42:32Z Preventing dielectric damage of low-k organic siloxane by passivation treatment Chang, TC; Mor, YS; Liu, PT; Tsai, TM; Chen, CW; Mei, YJ; Pan, FM; Wu, WF; Sze, SM
國立交通大學 2014-12-08T15:42:15Z Eliminating dielectric degradation of low-k organosilicate glass by trimethylchlorosilane treatment Chang, TC; Liu, PT; Mor, YS; Tsai, TM; Chen, CW; Mei, YJ; Pan, FM; Wu, WF; Sze, SM
國立交通大學 2014-12-08T15:42:08Z Recovering dielectric loss of low dielectric constant organic siloxane during the photoresist removal process Chang, TC; Mor, YS; Liu, PT; Tsai, TM; Chen, CW; Mei, YJ; Sze, SM
國立交通大學 2014-12-08T15:41:39Z The novel pattern method of low-k hybrid-organic-siloxane-polymer film using X-ray exposure Chang, TC; Tsai, TM; Liu, PT; Mor, YS; Chen, CW; Mei, YJ; Sheu, JT; Tseng, TY

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