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Institution	Date	Title	Author
國立交通大學	2014-12-08T15:05:46Z	Highly sensitive focus monitoring on production wafer by scatterometry measurements for 90/65-nm node devices	Kawachi, Toshihide; Fudo, Hidekimi; Iwata, Yoshio; Matsumoto, Shunichi; Sasazawa, Hideaki; Mori, Tadayoshi

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