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Showing items 1-11 of 11 (1 Page(s) Totally)
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| 臺大學術典藏 |
2020-06-16T06:34:48Z |
Non-delta-chrome optical proximity correction methodology for process models with three-dimensional mask effects (vol 10, 033010, 2011)
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Ng, Philip C. W.;Tsai, Kuen-Yu;Melvin, Lawrence S.; Ng, Philip C. W.; Tsai, Kuen-Yu; Melvin, Lawrence S.; KUEN-YU TSAI |
| 臺大學術典藏 |
2018-09-10T08:46:32Z |
Impact of process-effect correction strategies on variability of critical dimension and electrical characteristics in extreme ultraviolet lithography
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Ng, Sheng-Wei ; Chien, Bo-Sen ; Chang, Kuen-Yu ; Tsai*, Yi-Chang ; Lu, Jia-Han ; Li,Alek C.; ChenNg, Philip C.W.; Chien, Sheng-Wei; Chang, Bo-Sen; Tsai, Kuen-Yu; Lu, Yi-Chang; Li, Jia-Han; Chen, Alek C.; Ng, Philip C.W.; Chien, Sheng-Wei; Chang, Bo-Sen; Tsai, Kuen-Yu; Lu, Yi-Chang; Li, Jia-Han; Chen, Alek C.; YI-CHANG LU; KUEN-YU TSAI; Li, Jia-Han |
| 臺大學術典藏 |
2018-09-10T08:42:00Z |
In situ beam drift detection using a two-dimensional electron-beam position monitoring system for multiple-electron-beam-direct-write lithography
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Tsai, Kuen-Yu; Ng, Philip C.W.; Ng, Hoi-Tou; Liu, Chun-Hung; Shen, Yu-Tian; Kuan, Chieh-Hsiung; Chen, Yung-Yaw; Kuo, Yi-Hung; Wu, Cheng-Ju; Yen, Jia-Yush; Chen, S.-Y.; CHIEH-HSIUNG KUAN; Tsai, Kuen-Yu; YUNG-YAW CHEN; JIA-YUSH YENet al. |
| 國立臺灣大學 |
2011 |
A fully model-based methodology for simultaneous correction of extreme ultraviolet mask shadowing and proximity effects
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Ng, Philip C. W.; Tsai, Kuen-Yu; Lee, Yen-Min; Li, Jia-Han; Wang, Fu-Min; Chen, Alek C. |
| 國立臺灣大學 |
2011 |
In situ beam drift detection using a two-dimensional electron-beam position monitoring system for multiple-electron-beam-direct-write lithography
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Chen, Sheng-Yung; Tsai, Kuen-Yu; Ng, Philip C.W.; Ng, Hoi-Tou; Liu, Chun-Hung; Shen, Yu-Tian; Kuan, Chieh-Hsiung; Chen, Yung-Yaw; Kuo, Yi-Hung; Wu, Cheng-Ju; Yen, Jia-Yush |
| 國立臺灣大學 |
2011 |
Impact of Process-Effect Correction Strategies on Variability of Critical Dimension and Electrical Characteristics in Extreme Ultraviolet Lithography
|
Ng, Philip C.W.; Chien, Sheng-Wei; Chang, Bo-Sen; Tsai, Kuen-Yu; Lu, Yi-Chang; Li, Jia-Han; Chen, Alek C. |
| 國立臺灣大學 |
2011 |
Errata: Fully model-based methodology for simultaneous correction of extreme ultraviolet mask shadowing and proximity effects
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Ng, Philip C.W.; Tsai, Kuen-Yu; Lee, Yen-Min; Wang, Fu-Min; Li, Jia-Han; Chen, Alek C. |
| 臺大學術典藏 |
2011 |
Errata: Fully model-based methodology for simultaneous correction of extreme ultraviolet mask shadowing and proximity effects
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Chen, Alek C.; Li, Jia-Han; Wang, Fu-Min; Lee, Yen-Min; Ng, Philip C.W.; Tsai, Kuen-Yu; Ng, Philip C.W.; Tsai, Kuen-Yu; Lee, Yen-Min; Wang, Fu-Min; Li, Jia-Han; Chen, Alek C. |
| 國立臺灣大學 |
2010 |
Efficient scattering simulations for equivalent extreme ultraviolet mask multilayer structures by modified transmission line theory and finite-difference time-domain method
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Lee, Yen-Min; Li, Jia-Han; Ng, Philip C. W.; Pei, Ting-Hang; Wang, Fu-Min; Tsai, Kuen-Yu; Chen, Alek C. |
| 國立臺灣大學 |
2008 |
Design of automatic controllers for model-based OPC with optimal resist threshold determination for improving correction convergence
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Su, Yi-Sheng; Ng, Philip C. W.; Tsai, Kuen-Yu; Chen, Yung-Yaw |
| 臺大學術典藏 |
2008 |
Design of automatic controllers for model-based OPC with optimal resist threshold determination for improving correction convergence
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Su, Yi-Sheng; Ng, Philip C. W.; Tsai, Kuen-Yu; Chen, Yung-Yaw; Su, Yi-Sheng; Ng, Philip C. W.; Tsai, Kuen-Yu; Chen, Yung-Yaw |
Showing items 1-11 of 11 (1 Page(s) Totally)
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