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| 臺大學術典藏 |
2019-12-27T07:49:42Z |
Nanometer thick single crystal Y2 O3 films epitaxially grown on Si (111) with structures approaching perfection
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Nieh, C.W.; Lee, Y.J.; Lee, W.C.; Yang, Z.K.; Kortan, A.R.; Hong, M.; Kwo, J.; Hsu, C.-H.; MINGHWEI HONG |
| 臺大學術典藏 |
2019-12-27T07:49:34Z |
Lattice strain and in situ chemical depth profiling of nanometer-thick molecular beam epitaxy grown Y2 O3 epitaxial films on Si (111)
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Lee, Y.J.;Lee, W.C.;Huang, M.L.;Wu, S.Y.;Nieh, C.W.;Hong, M.;Kwo, J.;Hsu, C.-H.; Lee, Y.J.; Lee, W.C.; Huang, M.L.; Wu, S.Y.; Nieh, C.W.; Hong, M.; Kwo, J.; Hsu, C.-H.; MINGHWEI HONG |
| 臺大學術典藏 |
2018-09-10T05:56:12Z |
High-quality Thin Single-Crystal Y2O3 films Grown on Si (111)
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Nieh, C-W; Lee, W-C; Yang, Z-K; Lee, Y-J; Cheng, Pen; Lin, T-D; Hong, M; Kwo, J; Hsu, C-H; MINGHWEI HONG |
| 國立交通大學 |
2014-12-08T15:12:14Z |
High-quality nanothick single-crystal Y(2)O(3) films epitaxially grown on Si (111): Growth and structural characteristics
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Lee, Y. J.; Lee, W. C.; Nieh, C. W.; Yang, Z. K.; Kortan, A. R.; Hong, M.; Kwo, J.; Hsu, C. -H. |
| 臺大學術典藏 |
2008 |
High-quality nanothick single-crystal Y2 O3 films epitaxially grown on Si (111): Growth and structural characteristics
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Lee, Y.J.;Lee, W.C.;Nieh, C.W.;Yang, Z.K.;Kortan, A.R.;Hong, M.;Kwo, J.;Hsu, C.-H.; Lee, Y.J.; Lee, W.C.; Nieh, C.W.; Yang, Z.K.; Kortan, A.R.; Hong, M.; Kwo, J.; Hsu, C.-H.; MINGHWEI HONG |
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