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Showing items 46-55 of 96  (10 Page(s) Totally)
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Institution Date Title Author
國立中山大學 2006 Improvement of Hydrogenated Amorphous Silicon TFT Performances With Low-k Siloxane-Based Hydrogen Silsesquioxane (HSQ) Passivation Layer T.S. Chang;T.C. Chang;P.T. Liu;T.S. Chang;C.H. Tu;F.S. Yeh
國立中山大學 2006 High-performance polycrystalline silicon thin-film transistors with oxide–nitride–oxide gate dielectric and multiple nanowire channels S.C. Chen;T.C. Chang;P.T. Liu;Y.C. Wu;C.C. Tsai;T.S. Chang;Chen-Hsin Lien
國立中山大學 2005 Improvement of reliability for polycrystalline thin film transistor using self-aligned fluorinated silica glass spacers C.H. Tu;T.C. Chang;P.T. Liu;H.W. Zan;Y.H. Tai;Y.C. Wu;C.Y. Chang
國立中山大學 2005 Effects of oxygen plasma ashing on barrier dielectric SiCN film C.W. Chen;T.C. Chang;P.T. Liu;T.S. Tsai;T.Y. Tseng
國立中山大學 2005 Low power device with NiSi2 nanocrystals embedded in silicon dioxide layer P.H. Yen;C.H. Yu;L.J. Chen;H.H. Wu;P.T. Liu;T.C. Chang
國立中山大學 2005 Damage effect of fluorine implantation on PECVD alpha-SiOC barrier dielectric F.M. Yang;T.C. Chang;P.T. Liu;C.W. Chen;Y.H. Tai;J.C. Lou
國立中山大學 2005 An interfacial investigation of high dielectric constant material hafnium oxide on Si substrate S.C. Chen;J.C. Lou;C.H. Chien;P.T. Liu;T.C. Chang
國立中山大學 2005 High performance hydrogenated amorphous Si TFT for AMLCD and AMOLED C.W. Chen;T.C. Chang;P.T. Liu;T.Y. Tseng
國立中山大學 2005 Leakage conduction behavior in electron-beam-cured nanoporous silicate films P.T. Liu;T.M. Tsai;T.C. Chang
國立中山大學 2005 A novel distributed charge storage element fabricated by the oxidation of amorphous silicon carbide T.C. Chang;S.T. Yan;Y.T. Chen;P.T. Liu;S.M. Sze

Showing items 46-55 of 96  (10 Page(s) Totally)
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