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机构	日期	题名	作者
國立中山大學	2005	Memeory effect of oxide/ oxygen-incorporated silicon carbide/ oxide sandwiched structure	T.C. Chang;P.T. Liu;S.T. Yan;F.M. Yang;S.M. Sze
國立中山大學	2005	Enhanced performance of poly-Si thin film transistors using fluorine ion implantation	C.H. Tu;T.C. Chang;P.T. Liu;H.W. Zan;Y.H. Tai;Y.C. Wu;C.Y. Chang
國立中山大學	2005	Mobility enhancement of polycrystalline-Si thin-film transistor using nanowire channels by pattern-dependent metal-induced lateral crystallization	Y.C. Wu;T.C. Chang;P.T. Liu;Y.C. Wu;C.W. Chou;C.Y. Chang
國立中山大學	2004	Method to improve chemical-mechanical-planarization polishing rate of low-k methyl-silsesquiazane for ultralarge scale integrated interconnect application	T.C. Chang;T.M. Tsai;P.T. Liu;S.T. Yan;Y.C. Chang;H. Aoki;S.M. Sze;T.Y. Tseng
國立中山大學	2004	Study on the effect of electron beam curing on low-K porous organosilicate glass (OSG) material	T.C. Chang;T.M. Tsai;P.T. Liu;C.W. Chen;T.Y. Tseng
國立中山大學	2004	CMP of Ultra Low-k Material Porous-Polysilazane (PPSZ) for Interconnect Applications	T.C. Chang;T.M. Tsai;P.T. Liu;C.W. Chen;S.T. Yan;H. Aoki;Y.C. Chang;T.Y. Tseng
國立中山大學	2004	CMP of low-k methylsilsesquiazane with oxygen plasma treatment for multilevel interconnect applications	T.C. Chang;T.M. Tsai;P.T. Liu;C.W. Chen;S.T. Yan;H. Aoki;Y.C. Chang;T.Y. Tseng
國立中山大學	2004	CMP of ultra low-k material porous-polysilazane (PPSZ) for interconnect applications	T.C. Chang;T.M. Tsai;P.T. Liu;C.W. Chen;S.T. Yan;H. Aoki;T.Y. Tseng
國立中山大學	2004	A novel distributed charge storage with GeO2 nano-dots	T.C. Chang;S.T. Yan;P.T. Liu;C.H. Hsu;M.T. Tang;S.M. Sze
國立中山大學	2004	Extraction of electrical mechanisms of low-dielectric constant material MSZ for interconnect applications	T.C. Chang;S.T. Yan;P.T. Liu;H. Aoki;S.M. Sze
國立中山大學	2004	Structrual characteristics and interfacial reactions of low dielectric constant porous polysilazane for Cu metallization	J.H. Wang;P.T. Liu;T.C. Chang;L.J. Chen
國立中山大學	2004	CMP of ultra low-k Methylsilsesquiazane with oxygen plasma treatment for multilevel interconnect applications	T.C. Chang;T.M. Tsai;P.T. Liu;C.W. Chen;S.T. Yan;H. Aoki;T.Y. Tseng
國立中山大學	2004	Method to improve chemical-mechanical-planarization polishing rate of low-k methyl-silsesquiazane for ultralarge scale integraged interconnect application	T.C. Chang;T.M. Tsai;P.T. Liu;Y.C. Chang;J. Aoki;S.M. Sze;T.Y. Tseng
國立中山大學	2004	Quasisuperlattice storage: A concept of multilevel charge stoage	T.C. Chang;S.T. Yan;P.T. Liu;C.W. Chen;H.H. Wu;S.M. Sze
國立中山大學	2004	Cu-penetration induced breakdown mechanism for a-SiCN	C.W. Chen;P.T. Liu;T.C. Chang;J.H. Yang;T.M. Tsai;H.H. Wu;T.Y. Tseng
國立中山大學	2004	Leakage behavior of the quasi-superlattice stack for multilevel charge storage	T.C. Chang;S.T. Yan;P.T. Liu;C.W. Chen;H.H. Wu;S.M. Sze
國立中山大學	2004	Investigation of the electrical properties and reliability of amorphous SiCN	C.W. Chen;T.C. Chang;P.T. Liu;T.M. Tsai;C.H. Huang;J.M. Chen;T.Y. Tseng
國立中山大學	2004	Short-Channel Poly-Si thin film transistors with ultrathin chanel and self-alinged tungsten-clad source/drain	H.W. Zan;T.C. Chang;S.P. Shih;D.Z. Peng;P.Y. Kuo;T.Y. Huang;C.Y.C. Chang;P.T. Liu
國立中山大學	2004	Quasisuperlattice storage: A concept of multilevel charge stoage	T.C. Chang;S.T. Yan;P.T. Liu;C.W. Chen;H.H. Wu;S.M. Sze
國立中山大學	2004	A method of fabricating superior oxide/nitride/oxide gate stack	T.C. Chang;S.T. Yan;P.T. Liu;C.W. Chen;S.H. Lin;S.M. Sze
國立中山大學	2004	High performance polycrystalline silicon thin film transistor with multiple nano-wire channels and LDD structure	Y.C. Wu;T.C. Chang;P.T. Liu;H.W. Zan;Y.H. Tai
國立中山大學	2004	A novel approach for fabricating germanium nanocrystals for nonvolatile memory application	T.C. Chang;S.T. Yan;P.T. Liu;C.W. Chen;S.H. Lin;S.M. Sze
國立中山大學	2004	Study on eching profile of nanoporous silica	C.W. Chen;T.C. Chang;P.T. Liu;T.S. Tsai;H.H. Wu;T.Y. Tseng
國立中山大學	2004	Study on the effect of electron beam curing on low-K porous organosilicate glass (OSG) material	T.C. Chang;T.M. Tsai;P.T. Liu;C.W. Chen;T.Y. Tseng
國立中山大學	2004	Study on SONOS nonvolatile memeory technology using high-density plasma chemical vapor deposition	T.C. Chang;S.T. Yan;P.T. Liu;C.W. Chen;S.H. Lin;S.M. Sze
國立中山大學	2004	Pattern profile distortion and stress evolution in nanoporous organosilicates after photoresist stripping	P.T. Liu;T.C. Chang;C.W. Chen;T.Y. Tseng
國立中山大學	2004	Memory effect of oxide/SiC:O/Oxide sandwidthed structures	T.C. Chang;S.T. Yan;F.M. Yang;P.T. Liu;S.M. Sze
國立中山大學	2003	Direct Patterning of Low-k Hydrogen Silsesquioxane Using X-ray Exposure Technology	T.C. Chang;T.M. Tsai;P.T. Liu;Y.S. Mor;C.W. Chen;J.T. Sheu;T.Y. Tseng
國立中山大學	2003	A study of parasitic resistance effects in thin-channel polycrystalline silicon TFTs with tungsten-clad source/drain	H.W. Zan;T.C. Chang;S.P. Shih;D.Z. Peng;P.Y. Kuo;T.Y. Huang;C.Y.C. Chang;P.T. Liu
國立中山大學	2003	Moisture-induced material instability of porous organosilicate glass	T.C. Chang;C.W. Chen;P.T. Liu;Y.S. Mor;H.M. Tsai;T.M. Tsai;S.T. Yan;C.H. Tu;T.Y. Tsing;S.M. Sze
國立中山大學	2003	A novel SiGe raised source/drain polycrystalline silicon thin-film transistor with improved on-current and larger breakdown voltage	D.Z. Peng;T.C. Chang;Y.H. Yeh;P.T. Liu;C.Y. Chang
國立中山大學	2003	Structural and electrical characteristics of low-dielectric constant porous hydrogen silsequioxane for Cu metallization	J.H. Wang;T.C. Chang;P.T. Liu;S.L. Lin;L.J. Chen
國立中山大學	2003	Characteristics and stress-induced degradation of laser-activated low-temperature polycrystalline silicon thin-film transistors	D.Z. Peng;T.C. Chang;C.Y. Chang;M.L. Tsai;C.H. Tu;P.T. Liu
國立中山大學	2003	Direct Patterning of low-k hydrogen silsesquioxane using X-ray exposure technology	T.C. Chang;H.M. Tsai;P.T. Liu;Y.S. Mor;C.W. Chen;T.Y. Tsing
國立中山大學	2003	Dielectric characteristics of low-permittivity silicate using electron beam direct patterning for intermetal dielectric applications	P.T. Liu;T.C. Chang;T.M. Tasi;Z.W. Chen;B.C. Chen;S.M. Sze
國立中山大學	2003	Electrical transport phenomena in aromatic hydrocarbon polymer	P.T. Liu;T.C. Chang;S.T. Yan;C.H. Li;S.M. Sze

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