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Institution Date Title Author
國立交通大學 2019-04-02T05:59:55Z Effects of isolation oxides on undercut formation and electrical characteristics for silicon selective epitaxial growth Tseng, HC; Chang, CY; Pan, FM; Chen, LP
國立交通大學 2019-04-02T05:59:26Z STUDY OF SCHOTTKY BARRIERS ON N-TYPE GAN GROWN BY LOW-PRESSURE METALORGANIC CHEMICAL-VAPOR-DEPOSITION GUO, JD; FENG, MS; GUO, RJ; PAN, FM; CHANG, CY
國立交通大學 2019-04-02T05:59:14Z EFFECTS OF DRY-ETCHING DAMAGE REMOVAL ON LOW-TEMPERATURE SILICON SELECTIVE EPITAXIAL-GROWTH TSENG, HC; CHANG, CY; PAN, FM; CHEN, LP
國立交通大學 2014-12-08T15:46:26Z Effects of morphology and surface characteristics of poly(imide siloxane)s and deep UV/O-3 surface treatment on the interfacial adhesion of poly(imide siloxane)/alloy-42 leadframe joints Jwo, SL; Whang, WT; Hsieh, TE; Pan, FM; Liaw, WC
國立交通大學 2014-12-08T15:46:22Z Characterization of Si1-x-yGexCy films grown by C+ implantation and subsequent pulsed laser annealing Luo, JS; Lin, WT; Chang, CY; Shih, PS; Pan, FM; Chang, TC
國立交通大學 2014-12-08T15:46:11Z The novel improvement of low dielectric constant methylsilsesquioxane by N2O plasma treatment Chang, TC; Liu, PT; Mor, YS; Sze, SM; Yang, YL; Feng, MS; Pan, FM; Dai, BT; Chang, CY
國立交通大學 2014-12-08T15:45:53Z Annealing effects on the interfacial reactions of Ni on Si0.76Ge0.24 and Si1-x-yGexCy Luo, JS; Lin, WT; Chang, CY; Shih, PS; Pan, FM
國立交通大學 2014-12-08T15:44:42Z The effect of copper on gate oxide integrity Lin, YH; Wu, YH; Chin, A; Pan, FM
國立交通大學 2014-12-08T15:43:59Z The strong degradation of 30 angstrom gate oxide integrity contaminated by copper Lin, YH; Chen, YC; Chan, KT; Pan, FM; Hsieh, IJ; Chin, A
國立交通大學 2014-12-08T15:43:27Z An investigation of scanning capacitance microscopy on iron-contaminated p-type silicon Chang, MN; Chang, TY; Pan, FM; Wu, BW; Lei, TF

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