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| 國立成功大學 |
2023 |
Scaled contact length with low contact resistance in monolayer 2D channel transistors
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Wu, Wu W.-C.;Hung, T.Y.T.;Sathaiya, D.M.;Fan, D.;Arutchelvan, G.;Hsu, C.-F.;Su, Su S.-K.;Chou, A.S.;Chen, E.;Li, W.;Yu, Z.;Qiu, H.;Yang, Yang Y.-M.;Lin, K.-I.;Shen, Y.-Y.;Chang, W.-H.;Liew, S.L.;Hou, V.;Cai, J.;Wu, C.-C.;Wu, J.;Philip, Wong H.-S.;Wang, X.;Chien, Chien C.-H.;Cheng, Cheng C.-C.;Radu, I.P. |
| 國立成功大學 |
2023 |
How Fault-Tolerant Quantum Computing Benefits from Cryo-CMOS Technology
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Chiang, H.-L.;Hadi, R.A.;Wang, J.-F.;Han, Han H.-C.;Wu, J.-J.;Hsieh, Hsieh H.-H.;Horng, J.-J.;Chou, W.-S.;Lien, B.-S.;Chang, Chang C.-H.;Chen, Y.-C.;Wang, Y.-H.;Chen, T.-C.;Liu, J.-C.;Liu, Y.-C.;Chiang, M.-H.;Kao, Kao K.-H.;Pulicherla, B.;Cai, J.;Chang, Chang C.-S.;Su, K.-W.;Cheng, K.-L.;Yeh, T.-J.;Peng, Y.-C.;Enz, C.;Chang, M.-C.F.;Chang, M.-F.;Wong, H.-S.P.;Radu, I.P. |
| 國立成功大學 |
2022 |
pMOSFET with CVD-grown 2D semiconductor channel enabled by ultra-thin and fab-compatible spacer doping
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Hung, T.Y.T.;Li, M.-Z.;Yun, W.S.;Chou, S.A.;Su, Su S.-K.;Chen, E.;Liew, S.L.;Yang, Yang Y.-M.;Lin, K.-I.;Hou, V.;Lee, T.Y.;Wang, H.;Cheng, A.;Lin, M.-T.;Wong, H.-S.P.;Radu, I.P. |
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