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Institution Date Title Author
中原大學 2000 Etching Characteristics of Organic Low-k Dielectrics in the Helicon-wave Plasma Etcher for 0.15 μm Damascene Architecture. J.M. Shieh;T.C. Wei;C.H. Liu;S.C. Suen;B.T. Dai
中原大學 2000 The Study on Thermal Stability of Fluorinated Amorphous Carbon Film (a-C:F) Deposited by PECVD. S.C. Suen;J.M. Shieh;M.S. Tsai;B.T. Dai;C.H. Liu;T.C. Wei;

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