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| 臺大學術典藏 |
2017 |
Ferroelectric Al:HfO2 Negative Capacitance FETs
|
C. W. Liu; K.-S. Li; C. W. Liu;K.-S. Li;S.T. Chang;K.-T. Chen;C.-Y. Liao;S.-Y. Chen;Z.-Y. Wang;R.-C. Hong;S.-S. Gu;H.-H.Chen;C.-H. Tang;C.-Y. Kuo;Y.-C. Chou;S.-T. Fan;P.-G. Chen;M. H. Lee;M. H.Liao; M. H.Liao; M. H. Lee; P.-G. Chen; S.-T. Fan; Y.-C. Chou; C.-Y. Kuo; C.-H. Tang; H.-H.Chen; S.-S. Gu; R.-C. Hong; Z.-Y. Wang; S.-Y. Chen; C.-Y. Liao; K.-T. Chen; S.T. Chang |
| 臺大學術典藏 |
2017 |
Ferroelectric Al:HfO2 Negative Capacitance FETs
|
C. W. Liu; K.-S. Li; C. W. Liu;K.-S. Li;S.T. Chang;K.-T. Chen;C.-Y. Liao;S.-Y. Chen;Z.-Y. Wang;R.-C. Hong;S.-S. Gu;H.-H.Chen;C.-H. Tang;C.-Y. Kuo;Y.-C. Chou;S.-T. Fan;P.-G. Chen;M. H. Lee;M. H.Liao; M. H.Liao; M. H. Lee; P.-G. Chen; S.-T. Fan; Y.-C. Chou; C.-Y. Kuo; C.-H. Tang; H.-H.Chen; S.-S. Gu; R.-C. Hong; Z.-Y. Wang; S.-Y. Chen; C.-Y. Liao; K.-T. Chen; S.T. Chang |
Showing items 1-2 of 2 (1 Page(s) Totally)
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