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Showing items 16-25 of 83  (9 Page(s) Totally)
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Institution Date Title Author
國立交通大學 2014-12-08T15:44:50Z Effects of NH3-plasma nitridation on the electrical characterizations of low-k hydrogen silsesquioxane with copper interconnects Liu, PT; Chang, TC; Yang, YL; Cheng, YF; Sze, SM
國立交通大學 2014-12-08T15:44:42Z Improvement of post-chemical mechanical planarization characteristics on organic low k methylsilsesquioxane as intermetal dielectric Liu, PT; Chang, TC; Huang, MC; Yang, YL; Mor, YS; Tsai, MS; Chung, H; Hou, J; Sze, SM
國立交通大學 2014-12-08T15:44:23Z Energy and coordinate dependent effective mass and confined electron states in quantum dots Li, YM; Voskoboynikov, O; Lee, CP; Sze, SM
國立交通大學 2014-12-08T15:44:15Z 1.55-mu m and infrared-band photoresponsivity of a Schottky barrier porous silicon photodetector Lee, MK; Chu, CH; Wang, YH; Sze, SM
國立交通大學 2014-12-08T15:43:55Z Elimination of dielectric degradation for chemical-mechanical planarization of low-k hydrogen silisesquioxane Chang, TC; Liu, PT; Tsai, TM; Yeh, FS; Tseng, TY; Tsai, MS; Chen, BC; Yang, YL; Sze, SM
國立交通大學 2014-12-08T15:43:42Z Highly reliable chemical-mechanical polishing process for organic low-k methylsilsesquioxane Liu, PT; Chang, TC; Huang, MC; Tsai, MS; Sze, SM
國立交通大學 2014-12-08T15:43:18Z Electron energy level calculations for cylindrical narrow gap semiconductor quantum dot Li, YM; Liu, JL; Voskoboynikov, O; Lee, CP; Sze, SM
國立交通大學 2014-12-08T15:43:16Z Enhancing the resistance of low-k hydrogen silsesquioxane (HSQ) to wet stripper damage Chang, TC; Mor, YS; Liu, PT; Tsai, TM; Chen, CW; Mei, YJ; Sze, SM
國立交通大學 2014-12-08T15:43:16Z The effect of ammonia plasma treatment on low-k methyl-hybrido-silsesquioxane against photoresist stripping damage Chang, TC; Mor, YS; Liu, PT; Tsai, TM; Chen, CW; Mei, YJ; Sze, SM
國立交通大學 2014-12-08T15:43:16Z Improvement of low dielectric constant methylsilsesquioxane by boron implantation treatment Chang, TC; Mor, YS; Liu, PT; Tsai, TM; Chen, CW; Sze, SM; Mei, YJ

Showing items 16-25 of 83  (9 Page(s) Totally)
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