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Showing items 26-38 of 38  (2 Page(s) Totally)
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Institution Date Title Author
南台科技大學 2004 GaN MSM photodetectors with TiW transparent electrodes C. K. Wang; S. J. Chang; Y. K. Su;C. S. Chang; C. H. Kuo;T. K. Lin; T. K. Ko;唐經洲; Jing-Jou Tang; 邱裕中; Yu-Zung Chiou
南台科技大學 2004 Noise Analysis of AlGaN/GaN MOS-HFETs with Photochemical-Vapor Deposition SiO2 Layer Y. Z. Chiou; C. K. Wang; S. J. Chang; Y. K. Su; C. S. Chang; T. K. Lin; T. H. Fang; J. J. Tang
南台科技大學 2003-08 Photo-CVD SiO2 layers on AlGaN and AlGaN/GaN MOSHFET Y. Z. Chiou; S. J. Chang; Y. K. Su; senior member IEEE; C. K. Wang; T. K. Lin ; B. R. Huang
南台科技大學 2003-06 High transconductance AlGaN/GaN MOSHFETs with photo-CVD gate oxide C. K. Wang; T. K. Lin; Y. Z. Chiou; S. J. Chang; Y. K. Su; C. H. Kuo; T. K. Ko
南台科技大學 2003 AlGaN/GaN metal-oxide semiconductor heterostructure field-effect transistor with photo-chemical-vapor deposition SiO2 gate oxide C. K. Wang; Y. Z. Chiou; S. J. Chang; Y. K. Su; B. R. Huang; T. K. Lin; S. C. Chen;陳順智
南台科技大學 2003 Low Interface State Density AlGaN/GaN MOSHFETs with Photochemical Vapor Deposition SiO2 Layers C. K. Wang; S. J. Chang; Y. K. Su; Y. Z. Chiou; T. K. Lin; B. R. Huang
南台科技大學 2003 Low Interface State Density AlGaN/GaN MOSHFETs with Photochemical Vapor Deposition SiO2 Layers C. K. Wang; S. J. Chang; Y. K. Su; Y. Z. Chiou; T. K. Lin; B. R. Huang
國立中山大學 2002 Heat transfer and flow pattern during two-phase flow boiling of R-134a in horizontal smooth and microfin tubes M.H. Yu; T.K. Lin; C.C. Tseng
國立中山大學 2001 Simulation of Flow Induced Vibrations of Tube Bundle in Cross Flow T.K. Lin; M.H. Yu
國立中山大學 2001 Influence of acoustic forcing on the near field development of a heated plane jet M.H. Yu; T.K. Lin; Y.Y. Hsieh
中原大學 1999 Capacity Planning for a Twin Fab J. C. Chen;Y. C. Fan;J. Y. Wang;T. K. Lin;S. H. Leea;S. C. Wu;Y. J. Lan;
國立中山大學 1999 Flow Patterns Identification of Refrigerant R-134a in Horizontal Evaporator Tubes by Pressure Measurement M.H. Yu; T.K. Lin; C.T. Kuo
中原大學 1994 Improvement of Adhesion of Kevlar Fiber to Epoxy by Chemical Modification G. S. Sheu;T. K. Lin;S. S. Shyu;J. Y. Lai

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