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國立成功大學 |
2023-09 |
Development of EUV interference lithography for 25 nm line/space patterns
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Sahoo;A, K.;Chen;P, -h.;Lin;C, -h.;Liu;R, -s.;Lin;B, -j.;Kao;T, -s.;Chiu;P, -w.;Huang;T, -p.;Lai;W, -y.;Wang;J;Lee;Y, -y.;Kuan;C, -k. |
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