臺灣學術機構典藏系統 (Taiwan Academic Institutional Repository, TAIR)

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機構	日期	題名	作者
元智大學	Jun-18	Silicon etching of difluoromethane atmospheric pressure plasma jet combined with its spectroscopic analysis	Yu-Ching Sung; Ta-Chin Wei; You-Chia Liu; Chun Huang
元智大學	Feb-19	Research on the Gas Effect of Octafluorocyclobutane Plasma Jet at Atmospheric Pressure for Silicon Etching	Wei-Ting Liu; Ta-Chin Wei; Yu-Ching Sung; Chou-Yuan Cheng; Ting-Hao Chen; Chun Huang
元智大學	Dec-14	Tailoring Surface Properties of Nonwoven Polypropylene by Cyclonic Atmospheric Pressure Plasma	Ching-Yuan Tsai; Ta-Chin Wei; Ko-Shao Chen; Ruey-Shin Juang; Chun Huang
元智大學	Dec-14	Surface Characterization of Argon/Methane Mixture Atmospheric-Pressure Plasma-Treated Filtration Poly(Vinylidene Fluoride) Membrane and Its Flux Enhancement	Ruey-Shin Juang; Ko-Shao Chen; Ta-Chin Wei; Chi-Hung Liu; Ching-Yuan Tsai; Hsu-Yi Jheng; Chun Huang
元智大學	2018-03-04	The Comparison of Radio Frequency Difluoromethane and Methane Plasma Polymerizations in a Closed Reactor System	Yin-Che Huang; Ta-Chin Wei; Yu-Shuan Liu; Chun Huang
元智大學	2017-12-15	Research on the Gas Effect of Octafluorocyclobutane Plasma Jet at Atmospheric Pressure for Silicon Etching	Chou-Yuan Cheng; Ta-Chin Wei; Ting-Hao Chen; Wei-Ting Liu; Chun Huang
元智大學	2017-11-16	Silicon Etching of Difluoromethane Atmospheric Pressure Plasma Jet combined with Its Spectroscopic Analysis	Yu-Ching Sung; Ta-Chin Wei; You-Chia Liu; Chun Huang
中原大學	2006-04-18	Display Device with Passivation Structure	Ta-Chin Wei;Chih-Hung Su
南台科技大學	2005-12	Reaction Mechanism of Ethylene Oxide at Various Oxygen/Ethylene Oxide Ratios in an RF Cold Plasma Environment	廖渭銅; Wei-Tung Liao; Ta-Chin Wei; Lien-Te Hsieh; Cheng-Hsien Tsai; Minliang Shih
中原大學	2002-11-29	Kinetic Model of a Dielectric Barrier Discharge for Ozone Production	How Ming Lee;Moo Been Chang;Ta Chin Wei;
中原大學	2000-01	Dry Etching of Platinum Films with TiN Masks in an Ar/O2 Helicon Wave Plasma	Ming-Chung Chiang;Fu-Ming Pan;Han-Chung Cheng;Jeng-Shu Liu;Shih-Hsiung Chan;Ta-Chin Wei
中原大學	2000	Global Model of Plasma Chemistry in a High Density Argon/Hydrogen Discharge	Ta-Chin Wei;Chih-Chao Yang;Wen-Cheng Cheng
中原大學	2000	Plasma Treatment and Dry Etch Characteristics of Organic Low-k Dielectrics	Ta-Chin Wei;Chi-Hung Liu;Jia-Ming Shieh;Shich-Chang Suen;Bau-Tong Dai
中原大學	1999	Modelling the Discharge Region of A Microwave Generated Hydrogen Plasma	Chun-Ku Chen;Ta-Chin Wei;Lance R Collins;Jonathan Phillips

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