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Showing items 1-11 of 11 (1 Page(s) Totally)
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| 國立交通大學 |
2019-04-02T06:04:43Z |
Novel Silicon Surface Pre-Treatment (SSPT) technique for CMOS device performance boosting
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Lee, Da-Yuan; Chen, C. C.; Huang, C. H.; Lim, P. S.; Chan, M. H.; Yeh, M. S.; Huang, C. S.; Tao, H. J.; Mii, Y. J. |
| 臺大學術典藏 |
2018-09-10T07:05:00Z |
Two-dimensional dopant profiling by electrostatic force microscopy using carbon nanotube modified cantilevers
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Chin, S.-C.; Chang, Y.-C.; Hsu, C.-C.; Lin, W.-H.; Wu, C.-I.; Chang, C.-S.; Tsong, T.T.; Woon, W.-Y.; Lin, L.-T.; Tao, H.-J.; CHIH-I WU |
| 國立交通大學 |
2017-04-21T06:48:24Z |
High temperature stable [Ir3Si-TaN]/HfLaON CMOS with large work-function difference
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Wu, C. H.; Hung, B. F.; Chin, Albert; Wang, S. J.; Chen, W. J.; Wang, X. P.; Li, M. -F.; Zhu, C.; Jin, Y.; Tao, H. J.; Chen, S. C.; Liang, M. S. |
| 國立交通大學 |
2014-12-08T15:15:52Z |
HfSiON n-MOSFETs using low-work function HfSi chi gate
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Wu, C. H.; Hung, B. F.; Chin, Albert; Wang, S. J.; Yen, F. Y.; Hou, Y. T.; Jin, Y.; Tao, H. J.; Chen, S. C.; Liang, M. S. |
| 國立交通大學 |
2014-12-08T15:14:46Z |
High-temperature stable IrxSi gates with high work function on HfSiON p-MOSFETs
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Hung, B. F.; Wu, C. H.; Chin, Albert; Wang, S. J.; Yen, F. Y.; Hou, Y. T.; Jin, Y.; Tao, H. J.; Chen, Shih C.; Liang, Mong-Song |
| 國立交通大學 |
2014-12-08T15:14:22Z |
High-temperature stable HfLaON p-MOSFETs with high-work-function Ir3Si gate
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Wu, C. H.; Hung, B. F.; Chin, Albert; Wang, S. J.; Wang, X. P.; Li, M. -F.; Zhu, C.; Yen, F. Y.; Hou, Y. T.; Jin, Y.; Tao, H. J.; Chen, S. C.; Liang, M. S. |
| 國立交通大學 |
2014-12-08T15:12:42Z |
Modeling of nitrogen profile effects on direct tunneling probability in ultrathin nitrided oxides
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Liu, Po-Tsun; Huang, Chen-Shuo; Lee, D. Y.; Lim, P. S.; Lin, S. W.; Chen, C. C.; Tao, H. J.; Mii, Y. J. |
| 國立成功大學 |
2007-04 |
High-temperature stable HfLaON p-MOSFETs with high-work-function Ir3Si gate
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Wu, C. H.; Hung, B. F.; Chin, Albert; Wang, S. J.; Wang, X. P.; Li, M. F.; Zhu, C.; Yen, F. Y.; Hou, Y. T.; Jin, Y.; Tao, H. J.; Chen, S. C.; Liang, M. S. |
| 國立成功大學 |
2007-02 |
High-temperature stable IrxSi gates with high work function on HfSiON p-MOSFETs
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Hung, B. F.; Wu, C. H.; Chin, Albert; Wang, S. J.; Yen, F. Y.; Hou, Y. T.; Jin, Y.; Tao, H. J.; Chen, Shih C.; Liang, Mong-Song |
| 國立成功大學 |
2006-09 |
HfSiON n-MOSFETs using low-work function HfSi chi gate
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Wu, C. H.; Hung, B. F.; Chin, Albert; Wang, Shui-Jinn; Yen, F. Y.; Hou, Y. T.; Jin, Y.; Tao, H. J.; Chen, S. C.; Liang, M. S. |
| 國立成功大學 |
2006-06 |
HfAlON n-MOSFETs incorporating low-work function gate using ytterbium silicide
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Wu, C. H.; Hung, B. F.; Chin, Albert; Wang, Shui-Jinn; Yen, F. Y.; Hou, Y. T.; Jin, Y.; Tao, H. J.; Chen, S. C.; Liang, M. S. |
Showing items 1-11 of 11 (1 Page(s) Totally)
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