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Institution	Date	Title	Author
國立交通大學	2014-12-12T03:06:26Z	氟氮離子摻雜應用於金屬閘極與高介電常數絕緣層之低溫多晶矽薄膜電晶體	楊宗諭; Tsung-Yu Yang; 趙天生; Tien-Sheng Chao
義守大學	2007	Fama and French三因子模型之探討-分量迴歸	楊宗育; Tsung-yu Yang

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