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Showing items 1-8 of 8 (1 Page(s) Totally)
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| 國立交通大學 |
2015-12-02T02:59:32Z |
Pore morphology of low-k SiCxNy films prepared with a cyclic silazane precursor using plasma-enhanced chemical vapor deposition
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Tu, Hung-En; Su, Chun-Jen; Jeng, U-Ser; Leu, Jihperng |
| 國立交通大學 |
2015-07-21T08:28:36Z |
Effect of Porogen Incorporation on Pore Morphology of Low-k SiCxNy Films Prepared Using PECVD
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Tu, Hung-En; Su, Chun-Jen; Jeng, U-Ser; Leu, Jihperng |
| 國立交通大學 |
2015-05-12T02:59:37Z |
Electroluminescent device including moisture barrier layer
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Leu Jihperng; Syu Shu-Hao; Tu Hung-En; Wang Chih |
| 國立交通大學 |
2014-12-16T06:14:53Z |
CARBON-DOPED SILICON NITRIDE THIN FILM AND MANUFACTURING METHOD AND DEVICE THEREOF
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Leu Jihperng; Tu Hung-En; Chiu Wei-Gan |
| 國立交通大學 |
2014-12-16T06:14:50Z |
ELECTROLUMINESCENT DEVICE INCLUDING MOISTURE BARRIER LAYER
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Leu Jihperng; Syu Shu-Hao; Tu Hung-En; Wang Chih |
| 國立交通大學 |
2014-12-12T02:45:32Z |
利用電漿輔助化學氣相沉積系統製備低介電碳氮化矽薄膜之研究
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凃弘恩; Tu, Hung-En; 呂志鵬; Leu, Jihperng |
| 國立交通大學 |
2014-12-08T15:24:08Z |
Effect of surfactants on the porogen size in the low-k methylsilsesquioxane/polystyrene hybrid films
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Chen, Yu-Han; Tu, Hung-En; Leu, Jihperng |
| 國立交通大學 |
2014-12-08T15:22:59Z |
Low-k SiCxNy Films Prepared by Plasma-Enhanced Chemical Vapor Deposition Using 1,3,5-trimethyl-1,3,5-trivinylcyclotrisilazane Precursor
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Tu, Hung-En; Chen, Yu-Han; Leu, Jihperng |
Showing items 1-8 of 8 (1 Page(s) Totally)
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