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Institution Date Title Author
臺大學術典藏 2020-06-16T06:32:15Z Enhancement of gate-bias and current stress stability of P-type SnO thin-film transistors with SiNx/HfO2 passivation layers Hsu, S.-M.;Li, Y.-S.;Tu, M.-S.;He, J.-C.;Chiu, I.-C.;Chen, P.-G.;Lee, M.-H.;Chen, J.-Z.;Cheng, I.-C.; Hsu, S.-M.; Li, Y.-S.; Tu, M.-S.; He, J.-C.; Chiu, I.-C.; Chen, P.-G.; Lee, M.-H.; Chen, J.-Z.; Cheng, I.-C.; I-CHUN CHENG
臺大學術典藏 2020-06-16T06:32:15Z Enhancement of gate-bias and current stress stability of P-type SnO thin-film transistors with SiNx/HfO2 passivation layers Hsu, S.-M.;Li, Y.-S.;Tu, M.-S.;He, J.-C.;Chiu, I.-C.;Chen, P.-G.;Lee, M.-H.;Chen, J.-Z.;Cheng, I.-C.; Hsu, S.-M.; Li, Y.-S.; Tu, M.-S.; He, J.-C.; Chiu, I.-C.; Chen, P.-G.; Lee, M.-H.; Chen, J.-Z.; Cheng, I.-C.; I-CHUN CHENG

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