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Institution Date Title Author
國立中山大學 2003 Self-organized nanomolecular films on low-dielectric constant porous methyl silsesquioxane at room temperature J.C. Hu;C.W. Wu;W.C. Gau;L.J. Chen;T.C. Chang
國立中山大學 2003 Diffusion barrier properties of metallorganic chemical vapor deposited NbNxOyCz films for Cu metallization C.W. Wu;W.C. Gau;J.C. Hu;T.C. Chang;L.J. Chen
中原大學 1999 以電鍍方式沉積銅金屬導線應用在超大型積體電路之研究 高武群; W.C Gau
中原大學 1999 Copper Metallization for Future ULSI Technology C.-L. Cheng;W.-C. Gau;C.-T. Chang;Y.-S. Lin;J.-C. Hu;L.-J.Chen;C.-Y. Chang;
中原大學 1999 The Study of Cu Electroplating Mechanism in the ULSI Metallization W.-C. Gau;S.-J. Chang;M.-S. Feng;J.-C. Hu;T.-C. Chang;C.-L.Cheng;

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