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Institution Date Title Author
國立中山大學 2003 High Quality Fluorinated Silicon Dioxide Films Prepared by Temperature-Difference-Based Liquid-Phase Deposition with Ammonium Hydroxide Incorporation M.K. Lee; W.H. Shieh; C.M. Shih; S.Y. Lin; K.W. Tung
國立中山大學 2003 High Quality Nitrogen Doped Fluorinated Silicon Oxide Films Prepared by Temperature-Difference-Based Liquid-Phase Deposition M.K. Lee; W.H. Shieh; C.M. Shih; K.W. Tung
國立中山大學 2002-12 Nitrogen Incorporated SiOF Film by Temperature-Difference Based Liquid-Phase Deposition M.K. Lee;C.M. Shih;W.H. Shieh;K.W. Tung
國立中山大學 2002 Characteristics and growth mechanism of TixSi1-xOy films by liquid phase deposition M.K. Lee; C.M. Shih; W.H. Shieh
國立中山大學 2001-11 Fluorinated Silicon Dioxide Films Prepared by Temperature-Difference-Based Liquid-Phase Deposition with Ammonia Hydroxide Aqua Incorporation M.K. Lee;W.H. Shieh;C.M. Shih;S.Y. Lin

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