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Showing items 76-85 of 135  (14 Page(s) Totally)
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Institution Date Title Author
國立高雄第一科技大學 2002.06 Design of (ZrO2)x/(Cr2O3)y/(Al2O3)1-x-y superlattices for high transmittance APSM at 193 nm wavelength LAI, F.D.;WANG, L.A.
國立臺灣大學 2002-03 An insertion loss insensitive and mean wavelength stable polarized superfluorescent fiber source Wang, L.A.; Lee, C.D.; Su, H.C.; Chang, J.F.
國立臺灣大學 2002 Study of the Synthesis and Characterization of Methacrylate Photoresists Fu, S.C.; Lin, H.W.; Chou, W.Y.; Wang, L.A.; Hsieh, K.H.
國立臺灣大學 2002 Fabrication and characterization of aluminum oxide/chromium oxide superlattice for attenuated phase-shifting mask working at 193 nm wavelength Lai, F. D.; Wang, L. A.
國立臺灣大學 2002 Design of (ZrO2)x/(Cr2O3)y/(Al2O3)1?x?y superlattices for high transmittance APSM at 193 nm wavelength Lai, F. D.; Wang, L. A.
國立高雄第一科技大學 2001.12 Optical-constant tunable (ZrO2)x/(Cr2O3)y/(Al2O3)1-x-y optical superlattices for attenuated phase shift mask in ArF lithography Lai, F.D.;Wang, L.A.
國立臺灣大學 2001-07 Blue light-emitting diode fabrication of an InGaN/GaN epilayer bonded on a Si substrate by laser liftoff Chen, C.C.; Hsu, M.C.; Hsiao, J.R.; Yen, J.L.; Yang, Y.J.; Lin, C.H.; Wang, L.A.; Liu, C.C.
國立成功大學 2001 A study on adhesion and footing issues of HMDSO films as bottom antireflective coating for deep UV lithographies Lin, C. H.; Chen, H. L.; Wang, L. A.
國立成功大學 2001 Feasibility of utilizing hexamethyldisiloxane film as a bottom antireflective coating for 157 nm lithography Lin, C. H.; Wang, L. A.
國立臺灣大學 2001 Fiber dependence and coupling efficiency limitation for a lensed fiber integrated with a long period fiber grating Wang, L.A.; Chen, W.T.

Showing items 76-85 of 135  (14 Page(s) Totally)
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