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"wang l a"
Showing items 86-95 of 135 (14 Page(s) Totally)
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| 國立臺灣大學 |
2001 |
A study on adhesion and footing issues of HMDSO films as bottom antireflective coating for deep UV lithographies
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Lin, C. H.; Chen, H. L.; Wang, L. A. |
| 國立臺灣大學 |
2001 |
Optical properties of CrO/ZrO optical superlattice for attenuated phase shifting mask at 193 nm wavelength
|
Lai, F. D.; Wang, L. A. |
| 國立臺灣大學 |
2001 |
A wavelength- and loss-tunable band-rejection filter based on corrugated long-period fiber grating
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Lin, C.Y.; Wang, L.A. |
| 國立臺灣大學 |
2001 |
A torsion sensor made of a corrugated long period fibre grating
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Wang, L. A.; Lin, C. Y.; Chern, G. W. |
| 國立臺灣大學 |
2001 |
Optical-constant tunable (ZrO2)x/(Cr2O3)y/(Al2O3)1–x–y optical superlattices for attenuated phase shift mask in ArF lithography
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Lai, F. D.; Wang, L. A. |
| 國立臺灣大學 |
2001 |
Feasibility of utilizing hexamethyldisiloxane film as a bottom antireflective coating for 157 nm lithography
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Lin, C. H.; Wang, L. A. |
| 國立臺灣大學 |
2000-03 |
Corrugated long period fiber gratings as band-rejection filters
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Lin, C.Y.; Wang, L.A. |
| 國立成功大學 |
2000 |
Optimized bilayer hexamethyldisiloxane film as bottom antireflective coating for both KrF and ArF lithographies
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Lin, C. H.; Wang, L. A.; Chen, H. L. |
| 國立臺灣大學 |
2000 |
Optimized bilayer hexamethyldisiloxane film as bottom antireflective coating for both KrF and ArF lithographies
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Lin, C. H.; Wang, L. A.; Chen, H. L. |
| 國立臺灣大學 |
2000 |
A novel bottom antireflective coating working for both KrF and ArF excimer laser lithography
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Wang, L.A.; Chen, H.L. |
Showing items 86-95 of 135 (14 Page(s) Totally)
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