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Showing items 66-90 of 135 (6 Page(s) Totally) << < 1 2 3 4 5 6 > >> View [10|25|50] records per page
| 臺大學術典藏 |
2004 |
The utilization of fiber Bragg grating sensors to monitor high performance concrete at elevated temperature
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Lin, Yung Bin; Chern, Jenn Chuan; Chang, Kuo-Chun; Chan, Yin-Wen; Wang, L. A.; Lin, Yung Bin; Chern, Jenn Chuan; Chang, Kuo-Chun; Chan, Yin-Wen; Wang, L. A. |
| 國立高雄第一科技大學 |
2003.11 |
Ultrathin TiO2 amorphous films for high transmittance APSM blanks at 157 and 193 nm wavelength simultaneously
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Lai, F.D.;Chang, C.M.;Wang, L.A.;Yih, T.S. |
| 國立高雄第一科技大學 |
2003.06 |
Ultra-thin Cr2O3 well-crystallized films for high transmittance APSM in ArF line
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Lai, F.D;Huang, C.Y;Chang, C.M;Wang, L.A;Cheng, W.C |
| 國立臺灣大學 |
2003-12 |
Wavelength shift and split of cladding mode resonance in micro-bended long-period fiber grating under torsion
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Ivanov, .V.; Wang, L.A. |
| 國立臺灣大學 |
2003 |
Phase masks fabricated by interferometric lithography for working in 248 nm wavelength
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Cheng, W. C.; Wang, L. A.; Hsieh, C. Y. |
| 國立臺灣大學 |
2003 |
Ultra-thin Cr2O3 well-crystallized films for high transmittance APSM in ArF line
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Lai, F. D.; Huang, C. Y.; Chang, C. M.; Wang, L. A.; Cheng, W. C. |
| 國立臺灣大學 |
2003 |
Low alkaline contamination bottom antireflective coatings for both 193- and 157-nm lithography applications
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Chen, H. L.; Chuang, Y. F.; Lee, C. C.; Hsieh, C. I.; Ko, F. H.; Wang, L. A. |
| 國立臺灣大學 |
2003 |
A Highly Efficient Polarized Superfluorescent Fiber Source for Fiber-Optic Gyroscope Applications
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Su, H.C.; Wang, L.A. |
| 國立臺灣大學 |
2003 |
Ultrathin TiO2 amorphous films for high transmittance APSM blanks at 157 and 193 nm wavelength simultaneously
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Lai, F. D.; Chang, C. M.; Wang, L. A.; Yih, T. S. |
| 國立臺灣大學 |
2003 |
Phase masks working in 157 nm wavelength fabricated by immersion interference photolithography
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Cheng, W. C.; Wang, L. A. |
| 國立高雄第一科技大學 |
2002.06 |
Design of (ZrO2)x/(Cr2O3)y/(Al2O3)1-x-y superlattices for high transmittance APSM at 193 nm wavelength
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LAI, F.D.;WANG, L.A. |
| 國立臺灣大學 |
2002-03 |
An insertion loss insensitive and mean wavelength stable polarized superfluorescent fiber source
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Wang, L.A.; Lee, C.D.; Su, H.C.; Chang, J.F. |
| 國立臺灣大學 |
2002 |
Study of the Synthesis and Characterization of Methacrylate Photoresists
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Fu, S.C.; Lin, H.W.; Chou, W.Y.; Wang, L.A.; Hsieh, K.H. |
| 國立臺灣大學 |
2002 |
Fabrication and characterization of aluminum oxide/chromium oxide superlattice for attenuated phase-shifting mask working at 193 nm wavelength
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Lai, F. D.; Wang, L. A. |
| 國立臺灣大學 |
2002 |
Design of (ZrO2)x/(Cr2O3)y/(Al2O3)1?x?y superlattices for high transmittance APSM at 193 nm wavelength
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Lai, F. D.; Wang, L. A. |
| 國立高雄第一科技大學 |
2001.12 |
Optical-constant tunable (ZrO2)x/(Cr2O3)y/(Al2O3)1-x-y optical superlattices for attenuated phase shift mask in ArF lithography
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Lai, F.D.;Wang, L.A. |
| 國立臺灣大學 |
2001-07 |
Blue light-emitting diode fabrication of an InGaN/GaN epilayer bonded on a Si substrate by laser liftoff
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Chen, C.C.; Hsu, M.C.; Hsiao, J.R.; Yen, J.L.; Yang, Y.J.; Lin, C.H.; Wang, L.A.; Liu, C.C. |
| 國立成功大學 |
2001 |
A study on adhesion and footing issues of HMDSO films as bottom antireflective coating for deep UV lithographies
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Lin, C. H.; Chen, H. L.; Wang, L. A. |
| 國立成功大學 |
2001 |
Feasibility of utilizing hexamethyldisiloxane film as a bottom antireflective coating for 157 nm lithography
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Lin, C. H.; Wang, L. A. |
| 國立臺灣大學 |
2001 |
Fiber dependence and coupling efficiency limitation for a lensed fiber integrated with a long period fiber grating
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Wang, L.A.; Chen, W.T. |
| 國立臺灣大學 |
2001 |
A study on adhesion and footing issues of HMDSO films as bottom antireflective coating for deep UV lithographies
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Lin, C. H.; Chen, H. L.; Wang, L. A. |
| 國立臺灣大學 |
2001 |
Optical properties of CrO/ZrO optical superlattice for attenuated phase shifting mask at 193 nm wavelength
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Lai, F. D.; Wang, L. A. |
| 國立臺灣大學 |
2001 |
A wavelength- and loss-tunable band-rejection filter based on corrugated long-period fiber grating
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Lin, C.Y.; Wang, L.A. |
| 國立臺灣大學 |
2001 |
A torsion sensor made of a corrugated long period fibre grating
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Wang, L. A.; Lin, C. Y.; Chern, G. W. |
| 國立臺灣大學 |
2001 |
Optical-constant tunable (ZrO2)x/(Cr2O3)y/(Al2O3)1–x–y optical superlattices for attenuated phase shift mask in ArF lithography
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Lai, F. D.; Wang, L. A. |
Showing items 66-90 of 135 (6 Page(s) Totally) << < 1 2 3 4 5 6 > >> View [10|25|50] records per page
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