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"wang sw"
Showing items 46-55 of 103 (11 Page(s) Totally)
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| 國立交通大學 |
2014-12-08T15:44:54Z |
An improved rendering technique for ray tracing Bezier and B-spline surfaces
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Wang, SW; Shih, ZC; Chang, RH |
| 國立交通大學 |
2014-12-08T15:42:16Z |
An efficient and stable ray tracing algorithm for parametric surfaces
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Wang, SW; Shih, ZC; Chang, RC |
| 國立交通大學 |
2014-12-08T15:27:43Z |
Reactive ion etching of compound semiconductors grown by MOCVD technique with BCl3/SF6/Ar mixtures
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Chang, KM; Tsai, JY; Yeh, CB; Yeh, TH; Wang, SW; Jou, MJ |
| 國立交通大學 |
2014-12-08T15:18:20Z |
Novel single-poly EEPROM with damascene control-gate structure
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Sung, HC; Lei, TF; Hsu, TH; Wang, SW; Kao, YC; Lin, YT; Wang, CS |
| 國立交通大學 |
2014-12-08T15:04:06Z |
ACTIVITY-COEFFICIENTS OF ELECTRONS AND HOLES IN DEGENERATE SEMICONDUCTORS WITH NONUNIFORM COMPOSITION
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CHANG, KM; YEH, TH; WANG, SW; LEE, CH |
| 國立交通大學 |
2014-12-08T15:03:41Z |
A SIMPLE AND EFFICIENT PRETREATMENT TECHNOLOGY FOR SELECTIVE TUNGSTEN DEPOSITION IN LOW-PRESSURE CHEMICAL-VAPOR-DEPOSITION REACTOR
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CHANG, KM; YEH, TH; LI, CH; WANG, SW |
| 國立交通大學 |
2014-12-08T15:02:36Z |
Effects of gas ratio on electrical properties of electron-cyclotron-resonance nitride films grown at room temperature
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Chang, KM; Tsai, JY; Li, CH; Yeh, TH; Wang, SW; Yang, JY |
| 國立交通大學 |
2014-12-08T15:02:31Z |
Dry etching of polysilicon with high selectivity using a chlorine-based plasma in an ECR reactor
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Chang, KM; Yeh, TH; Wang, SW; Li, CH; Yang, JY |
| 國立交通大學 |
2014-12-08T15:02:25Z |
Influences of deposition temperature on thermal stability and moisture resistance of chemical vapor deposited fluorinated silicon oxide by using indirect fluorinating precursor
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Chang, KM; Wang, SW; Wu, CJ; Yeh, TH; Li, CH; Yang, JY |
| 國立交通大學 |
2014-12-08T15:02:24Z |
Influences of damage and contamination from reactive ion etching on selective tungsten deposition in a low-pressure chemical-vapor-deposition reactor
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Chang, KM; Yeh, TH; Wang, SW; Li, CH |
Showing items 46-55 of 103 (11 Page(s) Totally)
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