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Showing items 31-55 of 118  (5 Page(s) Totally)
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Institution Date Title Author
國立交通大學 2014-12-08T15:38:37Z Lateral migration of trapped holes in a nitride storage flash memory cell and its qualification methodology Zous, NK; Lee, MY; Tsai, WJ; Kuo, A; Huang, LT; Lu, TC; Liu, CJ; Wang, TH; Lu, WP; Ting, WC; Ku, J; Lu, CY
國立交通大學 2014-12-08T15:38:31Z Comparison of oxide breakdown progression in ultra-thin oxide silicon-on-insulator and bulk metal-oxide-semiconductor field effect transistors Chen, MC; Ku, SH; Chan, CT; Wang, TH
國立交通大學 2014-12-08T15:27:51Z INTERFACE TRAP INDUCED THERMIONIC AND FIELD EMISSION CURRENT IN OFF-STATE MOSFETS WANG, TH; CHANG, TE; HUANG, CM
國立交通大學 2014-12-08T15:27:37Z Field enhanced oxide charge detrapping in n-MOSFET's Wang, TH; Chang, TE; Chiang, LP; Huang, C
國立交通大學 2014-12-08T15:27:37Z Mechanisms and characteristics of oxide charge detrapping in n-MOSFET's Wang, TH; Chang, TE; Chiang, LP; Huang, CM; Guo, JC
國立交通大學 2014-12-08T15:27:30Z A new technique to measure an oxide trap density in a hot carrier stressed n-MOSFET Wang, TH; Chiang, LP; Chang, TE; Zous, NK; Shen, KY; Huang, C
國立交通大學 2014-12-08T15:27:29Z Investigation of oxide charge trapping and detrapping in a n-MOSFET Wang, TH; Chang, TE; Chiang, LP; Zous, NK; Huang, C
國立交通大學 2014-12-08T15:27:27Z Characterization of various stress-induced oxide traps in MOSFET's by using a novel transient current technique Wang, TH; Chiang, LP; Zous, NK; Chang, TE; Huang, C
國立交通大學 2014-12-08T15:27:15Z Voltage scaling and temperature effects on drain leakage current degradation in a hot carrier stressed n-MOSFET Wang, TH; Hsu, CF; Chiang, LP; Zous, NK; Chao, TS; Chang, CY
國立交通大學 2014-12-08T15:27:09Z A comparative study of SILC transient characteristics and mechanisms in FN stressed and hot hole stressed tunnel oxides Zous, NK; Wang, TH; Yeh, CC; Tsai, CW; Huang, CM
國立交通大學 2014-12-08T15:26:57Z Valence-band tunneling enhanced hot carrier degradation in ultra-thin oxide nMOSFETs Tsai, CW; Gu, SH; Chiang, LP; Wang, TH; Liu, YC; Huang, LS; Wang, MC; Hsia, LC
國立交通大學 2014-12-08T15:26:38Z Soft breakdown enhanced hysteresis effects in ultra-thin oxide SOI nMOSFETs Chen, MC; Tsai, CW; Gu, SH; Wang, TH
國立交通大學 2014-12-08T15:26:23Z Negative substrate bias enhanced breakdown hardness in ultra-thin oxide pMOSFETs Wang, TH; Tsai, CW; Chen, MC; Chan, CT; Chiang, HK; Lu, SH; Hu, HC; Chen, TF; Yang, CK; Lee, MT; Wu, DY; Chen, JK; Chien, SC; Sun, SW
國立交通大學 2014-12-08T15:26:17Z Impacts of HF etching on ultra-thin core gate oxide integrity in dual gate oxide CMOS technology Lee, DY; Lin, HC; Chen, CL; Huang, TY; Wang, TH; Lee, TL; Chen, SC; Liang, MS
國立交通大學 2014-12-08T15:25:57Z Multi-level memory systems using error control codes Chang, HC; Lin, CC; Hsiao, TY; Wu, JT; Wang, TH
國立交通大學 2014-12-08T15:25:49Z Comparison of oxide breakdown progression in ultra-thin oxide SOI and bulk pMOSFETs Chan, CT; Kuo, CH; Tang, CJ; Chen, MC; Wang, TH; Lu, SH; Hu, HC; Chen, TF; Yang, CK; Lee, MT; Wu, DY; Chen, JK; Chien, SC; Sun, SW
國立交通大學 2014-12-08T15:25:47Z Investigation of programmed charge lateral spread in a two-bit storage nitride flash memory cell by using a charge pumping technique Gu, SH; Wang, MT; Chan, CT; Zous, NK; Yeh, CC; Tsai, WJ; Lu, TC; Wang, TH; Ku, J; Lu, CY
國立交通大學 2014-12-08T15:25:27Z Investigation of post-NBTI stress recovery in pMOSFETs by direct measurement of single oxide charge de-trapping Chan, CT; Ma, HC; Tang, CJ; Wang, TH
國立交通大學 2014-12-08T15:19:37Z A novel fully CMOS process compatible PREM for SOC applications Yeh, CC; Wang, TH; Tsai, WJ; Lu, TC; Liao, YY; Zous, NK; Chin, CY; Chen, YR; Chen, MS; Ting, WC; Lu, CY
國立交通大學 2014-12-08T15:19:29Z A novel PHINES flash memory cell with low power program/erase, small pitch, two-bits-per-cell for data storage applications Yeh, CC; Wang, TH; Tsai, WJ; Lu, TC; Chen, MS; Liao, YY; Ting, WC; Ku, YHJ; Lu, CY
國立交通大學 2014-12-08T15:18:55Z Mechanism for slow switching effect in advanced low-voltage, high-speed Pb(Zr1-XTiX)O-3 ferroelectric memory Tsai, CW; Lai, SC; Yen, CT; Lien, HM; Lung, HL; Wu, TB; Wang, TH; Liu, R; Lu, CY
國立交通大學 2014-12-08T15:18:45Z Substrate-bias-dependent dielectric breakdown in ultrathin-oxide p-metal-oxide-semiconductor field-effect transistors Chiang, S; Lu, MF; Huang-Lu, S; Chien, SC; Wang, TH
國立交通大學 2014-12-08T15:18:29Z Excess low-frequency noise in ultrathin oxide n-MOSFETs arising from valence-band electron tunneling Wu, JW; You, JW; Ma, HC; Cheng, CC; Hsu, CF; Chang, CS; Huang, GW; Wang, TH
國立交通大學 2014-12-08T15:17:56Z Electromigration lifetime improvement of copper interconnect by cap/dielectric interface treatment and geometrical design Lin, MH; Lin, YL; Chen, JM; Yeh, MS; Chang, KP; Su, KC; Wang, TH
國立交通大學 2014-12-08T15:17:37Z Characterization of programmed charge lateral distribution in a two-bit storage nitride flash memory cell by using a charge-pumping technique Gu, SH; Wang, TH; Lu, WP; Ting, WC; Ku, YHJ; Lu, CY

Showing items 31-55 of 118  (5 Page(s) Totally)
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