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"wang tien ko"的相關文件
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| 國立交通大學 |
2014-12-08T15:10:30Z |
Crucial integration of high work-function metal gate and high-k blocking oxide on charge-trapping type flash memory device
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Tsai, Ping-Hung; Chang-Liao, Kuei-Shu; Yang, Dong-Wei; Chung, Yuan-Bin; Wang, Tien-Ko; Tzeng, P. J.; Lin, C. H.; Lee, L. S.; Tsai, M. J.; Chin, Albert |
| 國立虎尾科技大學 |
2007 |
Effect of nitrogen content in HfxTayN metal gate on work function and thermal stability of advanced metal-oxide-semiconductor devices
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Tsai , Ping-Hung;Chang-Liao, Kuei-Shu;Wang, Tzu-Cheng;Wang, Tien-Ko;Tsai, Chuen-Horng;Cheng, Chin-Lung |
| 國立虎尾科技大學 |
2007 |
Reliability and Thermal Stability of Clustered Vertical Furnace-Grown SiO2 With HfxTayN Metal Gate for Advanced MOS Device Application
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Chang-Liao, Kuei-Shu;Cheng, Chin-Lung;Lu, Chun-Yuan;Sahu, Bhabani Shankar;Wang, Tzu-Chen;Wang, Tien-Ko;Huang, Shang-Feng;Tsai, Wen-Fa;Ai, Chi-Fong |
| 國立虎尾科技大學 |
2006 |
Performance improvement of flash memories with HfOxNy/SiO2 stack tunnel dielectrics
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Lai, Hsiang-Yueh;Liao, Kuei-Shu Chang;Wang, Tien-Ko;Wang, Ping-Kun;Cheng, Chin-Lung |
| 國立虎尾科技大學 |
2006 |
Electrical characteristic enhancement of metal-oxide-semiconductor devices by incorporating WON buffer layer at HfTaSiON/Si interface
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Cheng, Chin-Lung;Chang-Liao, Kuei-Shu;Chang, Hsin-Chun;Wang, Tien-Ko |
| 國立虎尾科技大學 |
2006 |
Improvement on the Electrical Characteristics of HfO[sub x]N[sub y]Gated MetalOxideSemiconductor Devices by High-Temperature Annealing
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Cheng, Chin-Lung;Chang-Liao, Kuei-Shu;Wang, Tien-Ko |
| 國立虎尾科技大學 |
2005 |
Improved electrical and surface characteristics of metal-oxide-semiconductor device with gate hafnium oxynitride by chemical dry etching
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Cheng, Chin-Lung;Chang-Liao, Kuei-Shu;Wang, Tien-Ko |
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