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| 國立交通大學 |
2017-04-21T06:48:24Z |
High temperature stable [Ir3Si-TaN]/HfLaON CMOS with large work-function difference
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Wu, C. H.; Hung, B. F.; Chin, Albert; Wang, S. J.; Chen, W. J.; Wang, X. P.; Li, M. -F.; Zhu, C.; Jin, Y.; Tao, H. J.; Chen, S. C.; Liang, M. S. |
| 國立交通大學 |
2014-12-08T15:14:22Z |
High-temperature stable HfLaON p-MOSFETs with high-work-function Ir3Si gate
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Wu, C. H.; Hung, B. F.; Chin, Albert; Wang, S. J.; Wang, X. P.; Li, M. -F.; Zhu, C.; Yen, F. Y.; Hou, Y. T.; Jin, Y.; Tao, H. J.; Chen, S. C.; Liang, M. S. |
| 國立成功大學 |
2007-04 |
High-temperature stable HfLaON p-MOSFETs with high-work-function Ir3Si gate
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Wu, C. H.; Hung, B. F.; Chin, Albert; Wang, S. J.; Wang, X. P.; Li, M. F.; Zhu, C.; Yen, F. Y.; Hou, Y. T.; Jin, Y.; Tao, H. J.; Chen, S. C.; Liang, M. S. |
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