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"wang ying lang"的相关文件
显示项目 116-121 / 121 (共13页)
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| 國立成功大學 |
2003-11-15 |
The application of electrochemical metrologies for investigating chemical mechanical polishing of Al with a Ti barrier layer
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Chiu, Shao-Yu; Wang, Ying-Lang; Liu, Chuan-Pu; Lan, Jin-Kun; Ay, Chyung; Feng, Ming-Shiann; Tsai, Ming-Shih; Dai, Bau-Tong |
| 國立成功大學 |
2003-09 |
Mechanisms of circular defects for shallow trench isolation oxide deposition
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Lan, Jin-Kun; Wang, Ying-Lang; Liu, Chuan-Pu; Chao, Chuen-Guang; Ay, Chyung; Liu, Chi-Wen; Cheng, Yi-Lung |
| 國立成功大學 |
2003-06-30 |
In situ fluorine-modified organosilicate glass prepared by plasma enhanced chemical vapor deposition
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JangJean, Shiuh-Ko; Wang, Ying-Lang; Liu, Chuan-Pu; Hwang, Weng-Sing; Tseng, Wei-Tsu; Liu, Chi-Wen |
| 國立成功大學 |
2001-11 |
Characterization and reliability of low dielectric constant fluorosilicate glass and silicon rich oxide process for deep sub-micron device application
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Cheng, Y. L.; Wang, Ying-Lang; Liu, C. W.; Wu, Y. L.; Lo, Kuang-Yao; Liu, Chuan-Pu; Lan, J. K. |
| 國立成功大學 |
2001-11 |
Integration of MOCVD titanium nitride with collimated titanium and ion metal plasma titanium for 0.18-mu m logic process
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Lan, J. K.; Wang, Ying-Lang; Lo, Kuang-Yao; Liu, Chuan-Pu; Liu, C. W.; Wang, JK; Cheng, Y. L.; Chau, C. G. |
| 國立成功大學 |
2000-07-17 |
Microstructure-related resistivity change after chemical-mechanical polish of Al and W thin films
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Tseng, Wei-Tsu; Wang, Ying-Lang; Niu, James |
显示项目 116-121 / 121 (共13页)
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